公开(公告)号：US20220108875A1

公开(公告)日：2022-04-07

申请号：US17426148

申请日：2020-01-23

Applicant: LAM RESEARCH CORPORATION

Inventor： William THIE ,  Jisoo KIM ,  Alan J. MILLER ,  Lai WEl ,  Frank Y. LIN ,  Jun Hee Hee HAN ,  Jie LIU ,  Conan CHlANG ,  Michael John MARTIN ,  Nicholas John CELESTE

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/52 ,  C23C16/505 ,  C23C16/56

Abstract: A gas delivery system configured to provide deposition and etch gases to a processing chamber for a rapid alternating process includes a first valve arranged to provide deposition gas from a deposition gas manifold to a first zone of a gas distribution device via a first orifice and provide the deposition gas from the deposition gas manifold to a second zone of the gas distribution device via a second orifice having a diameters than the first orifice. A second valve is arranged to provide etch gas from the etch gas manifold to the first zone of the gas distribution device via a third orifice and provide the etch gas from the etch gas manifold to the second zone of the gas distribution device via a fourth orifice having a different diameter than the third orifice.

公开(公告)号：US20230126058A1

公开(公告)日：2023-04-27

申请号：US17913119

申请日：2021-03-22

Applicant: LAM RESEARCH CORPORATION

Inventor： Maolin LONG ,  Michael John MARTIN ,  Matthew Lowell TALLEY ,  Yuhou WANG ,  Alexander Miller PATERSON ,  David Robert BIGGS

IPC: H01J37/32

Abstract: A lid assembly for a processing chamber in a substrate processing system includes a dielectric window. The dielectric window includes an upper portion having flat upper and lower surfaces. The lower surface is a plasma-facing surface of the dielectric window. A lower portion of the dielectric window is cylindrical and extends downward from the lower surface and an outer diameter of the lower portion at least one of is aligned with a gap between inner and outer coils arranged above the dielectric window and overlaps one of the inner and outer coils.