公开(公告)号：US20210210314A1

公开(公告)日：2021-07-08

申请号：US17267920

申请日：2019-08-08

Applicant: LAM RESEARCH CORPORATION

Inventor： Yuhou WANG ,  Maolin LONG ,  Ying WU ,  Alexander Miller PATERSON

IPC: H01J37/32

Abstract: A drive circuit for providing RF power to a component of a substrate processing system includes a plasma source operating at a first frequency. A load includes the component of the substrate processing system. An impedance network connects the plasma source to the load. A current sensor senses current at an output of the plasma source. A voltage sensor senses voltage at the output of the plasma source. A controller includes a tuned frequency calculator configured to calculate a tuned frequency for the plasma source based on the voltage, the current, and a configuration of the impedance network and to adjust the first frequency based on the tuned frequency.