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    POLYIMIDE COPOLYMER AND POLYIMIDE FILM USING SAME
    1.
    发明申请
    POLYIMIDE COPOLYMER AND POLYIMIDE FILM USING SAME 有权

    公开(公告)号：US20210292555A1

    公开(公告)日：2021-09-23

    申请号：US16482885

    申请日：2018-07-17

    Applicant: LG CHEM, LTD.

    Inventor： Cheolmin YUN ,  Kyungjun KIM

    IPC: C08L79/08 ,  C08G73/10 ,  C08G77/26 ,  C08G77/00 ,  C08K5/20 ,  C08K5/3415

    Abstract: A polyimide copolymer according to the present invention has a particular structure in which siloxane structures are distributed in a nanosize in a polymer and thus enables excellent transparency, heat resistance, mechanical strength and flexibility and effective reduction of residual stress, and thus can be used in various fields such as a substrate for a device, a cover substrate for a display, an optical film, an integrated circuit (IC) package, an adhesive film, a multi-layer flexible printed circuit (FPC), tape, a touch panel and a protective film for an optical disk.

    MODIFIED POLYIMIDE AND CURABLE RESIN COMPOSITION
    3.
    发明申请
    MODIFIED POLYIMIDE AND CURABLE RESIN COMPOSITION 审中-公开

    公开(公告)号：US20190309118A1

    公开(公告)日：2019-10-10

    申请号：US16391879

    申请日：2019-04-23

    Applicant: LG CHEM, LTD.

    Inventor： Cheolmin YUN ,  Kyungjun KIM

    IPC: C08F290/06 ,  C08G73/10 ,  C09D179/08 ,  C08J5/18 ,  C09D151/08 ,  C09D7/20

    Abstract: A modified polyimide represented by Formula 4: wherein D is a heat curable or photocurable functional group, R is a divalent or higher polyvalent organic group, and n is an integer of 1 or greater, X1, X2, X3, and X4 are each independently a tetravalent organic group derived from a tetracarboxylic dianhydride, Y1, Y2, and Y3 are each independently a divalent organic group derived from a diamine, p, q, r, and v are each independently an integer of 0 or greater, with the proviso that p, q, r, and v are not simultaneously 0, and r+v is 1 or greater. Additionally, curable resin compositions including the modified polyimide, as well as polyimide films including a cured product of the curable resin composition, and methods for preparing the modified polyimide.

    DIAMINE COMPOUND AND METHOD FOR PRODUCING SAME
    8.
    发明申请
    DIAMINE COMPOUND AND METHOD FOR PRODUCING SAME 审中-公开

    公开(公告)号：US20190292138A1

    公开(公告)日：2019-09-26

    申请号：US16316536

    申请日：2017-08-11

    Applicant: LG CHEM, LTD.

    Inventor： Cheolmin YUN ,  Jun Sik SUH ,  Kyungjun KIM

    IPC: C07C237/40 ,  C08G73/10 ,  C08G73/14 ,  C07C231/02 ,  G02B1/04

    Abstract: The present invention provides a novel diamine compound capable of producing a polymer which exhibits greatly enhanced mechanical properties and heat resistance while maintaining transparency. A film including a polymer produced using the diamine compound has excellent transparency, heat resistance, mechanical strength and flexibility, and thus can be used in various fields, such as in a device substrate, a display cover substrate, an optical film, an Integrated circuit (IC) package, an adhesive film, a multi-layer flexible printed circuit (FPC), a tape, a touch panel and an optical disc protection film, and the like.

    POLYIMIDE FILM FORMING COMPOSITION AND POLYIMIDE FILM PRODUCED BY USING SAME
    9.
    发明申请
    POLYIMIDE FILM FORMING COMPOSITION AND POLYIMIDE FILM PRODUCED BY USING SAME 审中-公开

    公开(公告)号：US20190276618A1

    公开(公告)日：2019-09-12

    申请号：US16345523

    申请日：2017-10-27

    Applicant: LG CHEM, LTD.

    Inventor： Bo Ra SHIN ,  Cheolmin YUN ,  Hye Won JEONG ,  Kyungjun KIM

    IPC: C08J5/18 ,  C08G73/10 ,  C08K5/5465

    Abstract: The present invention provides a polyimide film forming composition which comprises a polyamic acid or a polyimide in an oligomer form or in a low-molecular weight form, the polyamic acid or the polyimide being prepared from a diamine containing an intramolecular imide group, and thus can provide a polyimide film having improved heat resistance while retaining optical properties thereof. In addition, the polyimide film according to the present invention can reduce not only a laser energy density (E/D) required in the laser exfoliation process but also remarkably decrease an amount of ash generated by an exfoliation process, thereby further improving the reliability of a device in a display manufacturing process.

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