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公开(公告)号：US10055629B2
公开(公告)日：2018-08-21
申请号：US14814572
申请日：2015-07-31
Applicant: LG INNOTEK CO., LTD.
Inventor： Seung Jin Kim , Jae Wan Park , Hyun Soo Kim , Jung Hwan Bang , Dong Keun Lee , Sin Ae Jang , Jong Seon Jeong , Kyoung Jong Yoo
CPC classification number: G06K9/0002 , G06F3/041 , G06K9/00053
Abstract: A fingerprint sensor includes a piezoelectric substrate, and an electrode on the piezoelectric substrate. The electrode includes a first electrode and a second electrode on at least one of one surface of the piezoelectric substrate and an opposite surface opposite to the one surface. The electrode includes a node area in which the first electrode crosses the second electrode, and the node area transmits and receives a signal by an object that makes contact with the node area or approaches the node area in a direction of the piezoelectric substrate. The fingerprint sensor includes a substrate including a first area to a fourth area. At least one of first and second electrodes is provided in the first area to the third area, and a chip connected with the first and second electrodes is provided in the fourth area.
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2.发明申请公开(公告)号：US20140272316A1
公开(公告)日：2014-09-18
申请号：US14358701
申请日：2012-12-11
Applicant: LG INNOTEK CO., LTD.
Inventor： Jun Lee , Kyoung Jong Yoo , Young Jae Lee , Jin Su Kim
IPC: H01L23/498 , H05K1/03
CPC classification number: H01L23/49894 , B82Y30/00 , G03F7/002 , G06F3/041 , G06F2203/04103 , H01L2924/0002 , H05K1/036 , Y10T428/24612 , H01L2924/00
Abstract: Provided are a transparent substrate having a nano pattern, and a method of manufacturing the same, which enables the nano pattern to be easily formed on the transparent substrate and has the nano pattern applicable to a large sized substrate by forming a resin layer made of transparent material on a transparent substrate; forming at least one or more unit pattern parts composed of a first pattern area and a second pattern area in which a plurality of grid patterns are formed, and a protrusion pattern formed between the first pattern area and the second pattern area, on the resin layer; and forming a nanoscale metal layer on the protrusion pattern.
Abstract translation: 提供一种具有纳米图案的透明基板及其制造方法，其能够容易地在透明基板上形成纳米图案，并且通过形成由透明的树脂层形成的具有适合于大尺寸基板的纳米图案 材料在透明基板上; 形成由形成有多个格栅图案的第一图案区域和第二图案区域构成的至少一个以上的单位图案部分，以及形成在第一图案区域和第二图案区域之间的突起图案，树脂层 ; 并在突起图案上形成纳米尺度的金属层。
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3.发明授权公开(公告)号：US09536819B2
公开(公告)日：2017-01-03
申请号：US14358701
申请日：2012-12-11
Applicant: LG INNOTEK CO., LTD.
Inventor： Jun Lee , Kyoung Jong Yoo , Young Jae Lee , Jin Su Kim
IPC: H01L23/498 , H05K1/03 , G03F7/00 , B82Y30/00
CPC classification number: H01L23/49894 , B82Y30/00 , G03F7/002 , G06F3/041 , G06F2203/04103 , H01L2924/0002 , H05K1/036 , Y10T428/24612 , H01L2924/00
Abstract: Provided are a transparent substrate having a nano pattern, and a method of manufacturing the same, which enables the nano pattern to be easily formed on the transparent substrate and has the nano pattern applicable to a large sized substrate by forming a resin layer made of transparent material on a transparent substrate; forming at least one or more unit pattern parts composed of a first pattern area and a second pattern area in which a plurality of grid patterns are formed, and a protrusion pattern formed between the first pattern area and the second pattern area, on the resin layer; and forming a nanoscale metal layer on the protrusion pattern.
Abstract translation: 提供一种具有纳米图案的透明基板及其制造方法，其能够容易地在透明基板上形成纳米图案，并且通过形成由透明的树脂层形成的具有适合于大尺寸基板的纳米图案 材料在透明基板上; 形成由形成有多个格栅图案的第一图案区域和第二图案区域构成的至少一个以上的单位图案部分，以及形成在第一图案区域和第二图案区域之间的突起图案，树脂层 ; 并在突起图案上形成纳米尺度的金属层。
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公开(公告)号：US09496215B2
公开(公告)日：2016-11-15
申请号：US14358701
申请日：2012-12-11
Applicant: LG INNOTEK CO., LTD.
Inventor： Jun Lee , Kyoung Jong Yoo , Young Jae Lee , Jin Su Kim
IPC: H01L23/498 , H05K1/03 , G03F7/00 , B82Y30/00
Abstract: Provided are a transparent substrate having a nano pattern, and a method of manufacturing the same, which enables the nano pattern to be easily formed on the transparent substrate and has the nano pattern applicable to a large sized substrate by forming a resin layer made of transparent material on a transparent substrate; forming at least one or more unit pattern parts composed of a first pattern area and a second pattern area in which a plurality of grid patterns are formed, and a protrusion pattern formed between the first pattern area and the second pattern area, on the resin layer; and forming a nanoscale metal layer on the protrusion pattern.
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公开(公告)号：US09456501B2
公开(公告)日：2016-09-27
申请号：US14365506
申请日：2012-12-06
Applicant: LG INNOTEK CO., LTD.
Inventor： Young Jae Lee , Kyoung Jong Yoo , Jin Su Kim , Jun Lee
IPC: H05K1/09 , H05K3/46 , H05K3/16 , H05K3/00 , B81C99/00 , H01L29/06 , H05K1/02 , H05K3/06 , H05K3/10 , H05K3/14
CPC classification number: H05K3/007 , B81C99/008 , H01L29/0669 , H05K1/0274 , H05K1/0296 , H05K1/09 , H05K3/067 , H05K3/101 , H05K3/146 , H05K3/16 , H05K3/46 , H05K3/4685 , H05K2201/09227
Abstract: Provided is a method of manufacturing a nanowire, including: forming a plurality of grid patterns on a grid base layer; forming a sacrificial layer on the grid base layer on which the grid patterns are formed; producing a nanowire grid structure by forming a nanowire base layer on the sacrificial layer; forming a nanowire by wet etching the nanowire base layer; and separating the grid patterns from the nanowire by etching the sacrificial layer.
Abstract translation: 提供一种制造纳米线的方法，包括：在网格基底层上形成多个网格图案; 在其上形成网格图案的网格基底层上形成牺牲层; 通过在牺牲层上形成纳米线基底层来产生纳米线栅格结构; 通过湿法蚀刻纳米线基层形成纳米线; 并通过蚀刻牺牲层将网格图案与纳米线分离。
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Patent Agency Ranking
公开(公告)号：US20150000963A1
公开(公告)日：2015-01-01
申请号：US14365506
申请日：2012-12-06
Applicant: LG INNOTEK CO., LTD.
Inventor： Young Jae Lee , Kyoung Jong Yoo , Jin Su Kim , Jun Lee
CPC classification number: H05K3/007 , B81C99/008 , H01L29/0669 , H05K1/0274 , H05K1/0296 , H05K1/09 , H05K3/067 , H05K3/101 , H05K3/146 , H05K3/16 , H05K3/46 , H05K3/4685 , H05K2201/09227
Abstract: Provided is a method of manufacturing a nanowire, including: forming a plurality of grid patterns on a grid base layer; forming a sacrificial layer on the grid base layer on which the grid patterns are formed; producing a nanowire grid structure by forming a nanowire base layer on the sacrificial layer; forming a nanowire by wet etching the nanowire base layer; and separating the grid patterns from the nanowire by etching the sacrificial layer. Thus, the method can be provided with the following advantages; Because a wet etching time is adjusted, a width and a height of the nanowire to be produced can be adjusted; the nanowire can be produced at room temperature with a low cost; the nanowire can be produced in large quantities; and in spite of the mass production, the nanowire having high uniformity can be produced.
Abstract translation: 提供一种制造纳米线的方法，包括：在网格基底层上形成多个网格图案; 在其上形成网格图案的网格基底层上形成牺牲层; 通过在牺牲层上形成纳米线基底层来产生纳米线栅格结构; 通过湿法蚀刻纳米线基层形成纳米线; 并通过蚀刻牺牲层将网格图案与纳米线分离。 因此，该方法可以具有以下优点： 由于调整了湿蚀刻时间，因此能够调整生成的纳米线的宽度和高度。 纳米线可以在室温下以低成本生产; 纳米线可以大量生产; 尽管大量生产，但是可以生产具有高均匀性的纳米线。
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公开(公告)号：US10884548B2
公开(公告)日：2021-01-05
申请号：US16230719
申请日：2018-12-21
Applicant: LG INNOTEK CO., LTD.
Inventor： Eun Jung Jeon , Seung Jin Kim , Jong Sun Kim , Kyoung Jong Yoo , Byung Youl Moon , Dong Mug Seong , Jun Sik Shin , Yu Hong Jeon , Chan Kyu Koo
Abstract: A touch window includes a substrate; a sensing electrode on the substrate comprises a conductive pattern including plurality of conductive pattern line parts and a plurality of conductive pattern opening parts; a dummy pattern provided adjacent to the conductive pattern; and a wire connected with the sensing electrode, further a interval between the dummy pattern and the conductive pattern is greater than the line width of the conductive pattern also the plurality of conductive pattern line parts cross each other. In addition, the substrate comprises a flat portion and curved portion.
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公开(公告)号：US10037114B2
公开(公告)日：2018-07-31
申请号：US15126647
申请日：2015-05-07
Applicant: LG INNOTEK CO., LTD.
Inventor： Seung Jin Kim , Jong Sun Kim , Dong Mug Seong , Kyoung Jong Yoo
IPC: G06F3/044 , G02F1/1333 , G02F1/1368 , H01L27/32
CPC classification number: G06F3/044 , G02F1/13338 , G02F1/1368 , G06F2203/04111 , G06F2203/04112 , H01L27/323 , H01L27/3244
Abstract: A touch window according to an embodiment includes a substrate; a sensing electrode disposed on the substrate; and a wire electrode disposed on the substrate, wherein the at least one of the sensing electrode and the wire electrode is arranged in a form of a mesh.
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公开(公告)号：US09695499B2
公开(公告)日：2017-07-04
申请号：US14444740
申请日：2014-07-28
Applicant: LG INNOTEK CO., LTD.
Inventor： Young Jae Lee , Kyoung Jong Yoo , Jun Lee , Jin Su Kim , Jae Wan Park
IPC: C23C14/00 , H01L29/06 , C30B11/12 , C30B29/60 , B22F9/16 , C04B35/622 , B82Y10/00 , B22F1/00 , C23C16/01 , B82Y30/00 , B82Y40/00 , H01L29/66 , H01L29/775
CPC classification number: C23C14/0005 , B22F1/0044 , B22F9/16 , B82Y10/00 , B82Y30/00 , B82Y40/00 , C04B35/622 , C23C16/01 , C30B11/12 , C30B29/60 , H01L29/0673 , H01L29/66469 , H01L29/775 , Y10S977/888 , Y10S977/89 , Y10T428/24802 , Y10T428/298
Abstract: Provided is a nanowire manufacturing substrate, comprising a grid base layer on a substrate and a grid pattern formed by patterning the grid base layer, the grid pattern being disposed to produce a nanowire on a surface thereof. According to the present invention, the width and height of the nanowire can be adjusted by controlling the wet-etching process time period, and the nanowire can be manufactured at a room temperature at low cost, the nanowire can be mass-manufactured and the nanowire with regularity can be manufactured even in case of mass production.
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公开(公告)号：US10514731B2
公开(公告)日：2019-12-24
申请号：US15870087
申请日：2018-01-12
Applicant: LG INNOTEK CO., LTD.
Inventor： Young Jae Lee , Hyun Soo Kim , Jung Hwan Bang , Jun Sik Shin , Joon Hyuk Yang , Dong Mug Seong , Jun Phill Eom , Kyoung Jong Yoo , Jun Lee , Chan Kyu Koo
Abstract: Disclosed is a touch panel. The touch panel includes a substrate, and an electrode part formed in a mesh shape on the substrate. The electrode part includes a resin layer comprising first and second sub-patterns, and a transparent electrode on the first sub-pattern. A ratio of a width of the first sub-pattern to a width of the second sub-pattern is in a range of 1:0.01 to 1:0.5.
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