公开(公告)号：US20020170498A1

公开(公告)日：2002-11-21

申请号：US10144806

申请日：2002-05-15

Applicant: LG. Philips LCD Co., Ltd.

Inventor： Young Hun Paik

IPC: C23C016/00

CPC classification number: C23C16/5096 ,  C23C16/4581 ,  C23C16/4586

Abstract: A chemical vapor deposition apparatus includes a ground voltage source, a susceptor for placing a substrate, a center pin passing through the susceptor for lifting the substrate, and a ground member for connecting the center pin to the ground voltage source.

Abstract translation: 化学气相沉积装置包括接地电压源，用于放置基板的基座，通过基座提升基板的中心销，以及用于将中心销连接到地电压源的接地构件。