公开(公告)号：US06999157B2

公开(公告)日：2006-02-14

申请号：US10421271

申请日：2003-04-23

Applicant: Michio Kohno

Inventor： Michio Kohno

IPC: G03G27/42 ,  G03B27/54 ,  G03B27/32 ,  G03C5/00

CPC classification number: G03F7/70108 ,  G03F7/70183

Abstract: An illumination optical system for illuminating a reticle using light from a light source includes an illumination-light generating mechanism for generating a light amount distribution on a plane that has a substantially Fourier conversion relationship with the reticle while making variable a ratio of a light amount or area between a first area and a second area different from the first area, the first and second areas being on the plane, wherein light from the first area illuminates the reticle to resolve a desired pattern on the reticle, and light from the second area illuminates the reticle to restrain an auxiliary pattern on the reticle from resolving.

公开(公告)号：US5581348A

公开(公告)日：1996-12-03

申请号：US591916

申请日：1996-01-25

Applicant: Seiya Miura ,  Michio Kohno ,  Takehiko Iwanaga

Inventor： Seiya Miura ,  Michio Kohno ,  Takehiko Iwanaga

IPC: G01N21/94 ,  G01N21/95 ,  G01N21/00 ,  G02B27/10

CPC classification number: G01N21/94

Abstract: A surface state inspecting device includes an illumination system for illuminating a surface to be inspected, with a beam having non-uniform sectional intensity distribution, a uniforming system for substantially uniforming the sectional intensity distribution of the beam, and an inspecting portion for detecting scattered light from the surface to determine the state of the surface.

Abstract translation: 表面状态检查装置包括用于照射具有不均匀分布强度分布的光束的被检查表面的照明系统，用于使束的截面强度分布基本均匀化的均匀系统，以及用于检测散射光的检查部 从表面来确定表面的状态。

公开(公告)号：US5381225A

公开(公告)日：1995-01-10

申请号：US199971

申请日：1994-02-22

Applicant: Michio Kohno

Inventor： Michio Kohno

IPC: G01B11/30 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  G01N21/89

CPC classification number: G01N21/94 ,  G01N2021/95676

Abstract: An apparatus for inspecting a surface condition of an object having at least a first surface to be inspected and a second surface to be inspected with a higher detection resolution than the first surface includes a holding mechanism, and first and second inspection systems. The holding mechanism holds the object so as to dispose the second surface at a constant position irrespective of the distance between the first and second surfaces. The first and second inspection systems inspect the first and second surfaces of the object, respectively, and each includes an irradiator producing a condensed light beam to illuminate a surface of the object and a receiver for receiving light from a surface of the object. The first and second inspection systems set the angle subtended by the condensed light beam of the first inspection system to be smaller than the angle subtended by the condensed light beam of the second inspection system.

Abstract translation: 用于检查具有至少第一待检查表面的物体的表面状况的设备和具有比第一表面更高的检测分辨率的待检查的第二表面的设备包括保持机构以及第一和第二检查系统。 保持机构保持物体，以将第二表面设置在恒定位置，而与第一和第二表面之间的距离无关。 第一和第二检查系统分别检查物体的第一和第二表面，并且每个包括产生聚光的照射器以照射物体的表面的辐射器和用于从物体的表面接收光的接收器。 第一检测系统和第二检查系统将第一检查系统的凝结光束对向的角度设定为小于第二检查系统的聚光束所对向的角度。

公开(公告)号：US4886975A

公开(公告)日：1989-12-12

申请号：US348177

申请日：1989-05-02

Applicant: Eiichi Murakami ,  Michio Kohno ,  Akiyoshi Suzuki

Inventor： Eiichi Murakami ,  Michio Kohno ,  Akiyoshi Suzuki

IPC: G01N21/94 ,  G01N21/956

CPC classification number: G01N21/94 ,  G01N2021/4719 ,  G01N2021/95676

Abstract: An apparatus usable with an object having surfaces, for examining the states of the surfaces, includes on irradiating system for irradiating the surfaces of the object with a single light beam, and a plurality of light-receiving systems provided in association with the surfaces of the object, respectively, the plural light-receiving systems being arranged to receive light scatteringly reflected from the surfaces of the object, respectively, and to produce outputs corresponding to the states of the surfaces of the object, respectively.

Abstract translation: 可用于具有用于检查表面状态的表面的物体的装置包括用于用单个光束照射物体的表面的照射系统，以及与所述物体的表面相关联地设置的多个光接收系统 目的是分别将多个光接收系统分别接收从物体的表面散射地反射的光，并分别产生与物体的表面的状态相对应的输出。

公开(公告)号：US4705940A

公开(公告)日：1987-11-10

申请号：US757341

申请日：1985-07-22

Applicant: Michio Kohno

Inventor： Michio Kohno

IPC: H01L21/30 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  G01J1/20

CPC classification number: G03F9/7026

Abstract: A projection optical system including a projection optical element for projecting a pattern of a mask onto a wafer, wherein astigmatism is corrected with respect to a predetermined region of a field of the projection optical element and wherein the astigmatism is not corrected with respect to another region of the field of the projection optical element. Also provided is a detector for detecting a state of focus of the projection optical element with respect to the wafer, on the basis of the effect of the astigmatism on a light beam from the region of the field of the projection optical element, in which region the astigmatism is not corrected.

Abstract translation: 一种投影光学系统，包括用于将掩模的图案投影到晶片上的投影光学元件，其中相对于所述投影光学元件的场的预定区域校正散光，并且其中所述像散相对于另一区域不被校正 的投影光学元件的场。 还提供了一种用于基于像散对来自投影光学元件的场的区域的光束的影响来检测投影光学元件相对于晶片的焦点状态的检测器，其中区域 散光没有改正。

公开(公告)号：US06833905B2

公开(公告)日：2004-12-21

申请号：US10218855

申请日：2002-08-13

Applicant: Michio Kohno

Inventor： Michio Kohno

IPC: G03B2754

CPC classification number: G03F7/70058 ,  G03B27/54

Abstract: A light producing apparatus for irradiating a beam from a light source to a target to produce light having a wavelength different from the beam includes a first condensing optical system for condensing the beam from the light source, and an imaging optical system for imaging onto the target under a demagnification a condensing point of the beam by the first condensing optical system.

Abstract translation: 一种用于将来自光源的光束照射到靶以产生具有与光束不同的波长的光的发光装置包括：用于会聚来自光源的光束的第一聚光光学系统和用于成像到目标物上的成像光学系统 通过第一聚光光学系统缩小光束的凝结点。

公开(公告)号：US06621061B2

公开(公告)日：2003-09-16

申请号：US09820617

申请日：2001-03-30

Applicant: Michio Kohno

Inventor： Michio Kohno

IPC: G01J132

CPC classification number: G03F7/70058 ,  G03F7/70066 ,  G03F7/701 ,  G03F7/70558 ,  G03F7/70591 ,  G03F7/70941

Abstract: Disclosed is an exposure method, an exposure apparatus and a device manufacturing method, in which transmission factors of almost all optical systems, including a projection optical system, can be measured during an exposure process, and in which the exposure amount is controlled on the basis of it. The exposure apparatus includes an illumination optical system for illuminating a pattern of a reticle with a laser beam from an excimer laser, and a projection lens system for projecting the pattern illuminated by the illumination optical system onto a wafer, to thereby expose the wafer with the reticle pattern, wherein reflection light or ghost light produced at a surface of a lens of the projection lens system is received by a sensor and, on the basis of the an output of the sensor, the transmission factor of the projection lens system is measured. The exposure amount is then controlled on the basis of the measurement.

Abstract translation: 公开了一种曝光方法，曝光装置和装置制造方法，其中可以在曝光处理期间测量包括投影光学系统的几乎所有光学系统的透射因子，并且其中基于曝光量被控制 的。 曝光装置包括用于利用来自准分子激光器的激光束照射标线图案的照明光学系统和用于将由照明光学系统照射的图案投影到晶片上的投影透镜系统，从而将晶片暴露于晶片 掩模版图案，其中在投影透镜系统的透镜的表面处产生的反射光或重影光被传感器接收，并且基于传感器的输出，测量投影透镜系统的透射系数。 然后基于测量来控制曝光量。

公开(公告)号：US5963316A

公开(公告)日：1999-10-05

申请号：US954879

申请日：1997-10-21

Applicant: Seiya Miura ,  Michio Kohno ,  Nobuhiro Kodachi

Inventor： Seiya Miura ,  Michio Kohno ,  Nobuhiro Kodachi

IPC: G01B11/30 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G03F1/64 ,  G03F1/84 ,  H01L21/66

CPC classification number: G03F1/64 ,  G01N21/94 ,  G03F1/84

Abstract: A method and apparatus for inspecting a surface state are used to examine first and second surfaces, e.g., two surfaces of a glass substrate on which a device pattern is formed, or one surface of a glass substrate and a pellicle for preventing attachment of foreign particles. When the first surface is illuminated from the first surface side while the second surface is illuminated from the second surface side, the first and second surfaces are illuminated with polarized light beams polarized in directions orthogonal to each other, respectively, and reflectively scattered light from the first surface is detected through an analyzer which intercepts the same polarized light as the polarized light illuminating the second surface. The S/N ratio of examination of the first surface is thereby improved.

Abstract translation: 用于检查表面状态的方法和装置用于检查第一和第二表面，例如其上形成有器件图案的玻璃基板的两个表面，或用于防止外来颗粒附着的玻璃基板和防护薄膜的一个表面 。 当从第一表面侧照亮第一表面而从第二表面侧照亮第二表面时，第一表面和第二表面被分别以彼此正交的方向偏振的偏振光照射，并且反射散射来自 通过分析器检测第一表面，该分析器拦截与照射第二表面的偏振光相同的偏振光。 从而提高了第一表面的检查的S / N比。

公开(公告)号：US5581089A

公开(公告)日：1996-12-03

申请号：US300451

申请日：1994-09-02

Applicant: Michio Kohno

Inventor： Michio Kohno

IPC: G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G06T1/00 ,  G01N21/64

CPC classification number: G01N21/94

Abstract: A reticle is inspected for color center defects by using excimer laser used for pattern transfer to a wafer to cause fluoresence of the color centers.

Abstract translation: 通过使用用于图案转移到晶片的准分子激光器来引导色中心的荧光，来检查掩模版的颜色中心缺陷。

公开(公告)号：US5399867A

公开(公告)日：1995-03-21

申请号：US232462

申请日：1994-04-22

Applicant: Michio Kohno

Inventor： Michio Kohno

IPC: G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G06T1/00 ,  G01N21/64

CPC classification number: G01N21/94

Abstract: A foreign particle inspection arrangement includes an optical illumination system that irradiates a predetermined area of a substrate surface with fluorescence exciting ultraviolet light pulses. Fluorescence from a foreign particle on the substrate is directed by an optical detection system to a photoelectric transducer which detects accumulation of fluorescence in response to plural ultraviolet light pulses. An electrical processing system inspects the adherence of the foreign particle to the substrate on the basis of the photoelectric transducer output. A position determining type of photoelectric transducer such as a charge coupled array or pickup tube may be used to determine the position of the foreign particle to avoid misdetection due to readherence. The illumination of a large area keeps the radiation density low to prevent damage to a reticle pattern on the substrate.

Abstract translation: 外来粒子检查装置包括用荧光激发紫外光脉冲照射衬底表面的预定区域的光学照明系统。 来自基板上的异物的荧光由光学检测系统引导到光电转换器，其响应于多个紫外光脉冲检测荧光的积累。 电处理系统基于光电变换器输出来检查外来颗粒对基板的粘附。 可以使用诸如电荷耦合阵列或拾取管的光电转换器的位置确定类型来确定外来颗粒的位置，以避免由于读取而导致错误检测。 大面积的照明保持辐射密度低，以防止损坏基板上的标线图案。