公开(公告)号：US12203745B2

公开(公告)日：2025-01-21

申请号：US17623570

申请日：2020-07-02

Applicant: Nikon Corporation

Inventor： Eric Peter Goodwin ,  Heather Lynn Durko ,  Daniel Gene Smith ,  Johnathan Agustin Marquez ,  Michael Birk Binnard ,  Patrick Shih Chang ,  Matthew Parker-McCormick Bjork ,  Paul Derek Coon ,  Brett William Herr ,  Motofusa Ishikawa

IPC: G01B11/25 ,  B22F10/80 ,  B22F12/90 ,  B33Y30/00 ,  B33Y50/00

Abstract: 3D metrology techniques are disclosed for determining a changing topography of a substrate processed in an additive manufacturing system. Techniques include fringe scanning, simultaneous fringe projections, interferometry, and x-ray imaging. The techniques can be applied to 3D printing systems to enable rapid topographical measurements of a 3D printer powder bed, or other rapidly moving, nearly continuous surface to be tested. The techniques act in parallel to the system being measured to provide information about system operation and the topography of the product being processed. A tool is provided for achieving higher precision, increasing throughput, and reducing the cost of operation through early detection and diagnosis of operating problems and printing defects. These techniques work well with any powder bed 3D printing system, providing real-time metrology of the powder bed, the most recently printed layer, or both without reducing throughput.

公开(公告)号：US12104891B1

公开(公告)日：2024-10-01

申请号：US16989157

申请日：2020-08-10

Applicant: Nikon Corporation

Inventor： Daniel Gene Smith ,  Goldie Lynne Goldstein ,  Hidemitsu Toba ,  Shunsuke Kibayashi ,  Katsura Otaki ,  Eric Peter Goodwin

IPC: G01B11/16 ,  G01B9/02 ,  G01B9/02015 ,  G01B11/24

CPC classification number: G01B11/161 ,  G01B9/02024 ,  G01B9/02041 ,  G01B11/167 ,  G01B11/2441 ,  G01B2290/30

Abstract: A system for measuring a target grating includes an illumination source, a reference transmission grating, a pupil filter, and a detector. The illumination source is disposed to generate an incident light beam that illuminates the reference transmission grating. The reference transmission grating splits the incident light beam into a plurality of diffraction orders. The plurality of diffraction orders interrogates a target grating. The reference transmission grating and the target grating are parallel. The pupil filter allows transmission of a subset of diffraction orders of light that has been diffracted and/or reflected from the target grating after being split again by passing through the reference transmission grating. The detector takes a measurement of the subset of diffraction orders of light after transmission through the pupil filter.

公开(公告)号：US10794689B2

公开(公告)日：2020-10-06

申请号：US16212224

申请日：2018-12-06

Applicant: Nikon Corporation

Inventor： Daniel Gene Smith ,  Eric Peter Goodwin

IPC: G01B9/02 ,  G01B11/25 ,  G01B11/06 ,  G03F7/20

Abstract: New and useful concepts for an autofocus system and method are provided. A basic concept uses fringe projection in an autofocus system and method. A further aspect provides spatial filtering concepts for the fringe projection concept. In yet another aspect, the fringe projection autofocus system and method is provided with temporal phase shifting using no moving parts. In a still further aspect, the fringe projection autofocus system and method is provided with unambiguous height measurement concepts.

公开(公告)号：US20190204074A1

公开(公告)日：2019-07-04

申请号：US16298280

申请日：2019-03-11

Applicant: Nikon Corporation

Inventor： Eric Peter Goodwin

IPC: G01B11/24 ,  G03F7/20 ,  G01M11/00 ,  G01J9/02 ,  G01M11/02

CPC classification number: G01B11/2441 ,  G01J9/02 ,  G01M11/005 ,  G01M11/0271 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70291 ,  G03F7/70591

Abstract: System and method for monitoring of performance of a mirror array of a digital scanner with a use of a lateral shearing interferometer (operated in either static or a phase-shifting condition) to either simply identify problematic pixels for further troubleshooting or measure the exact magnitude of the mirror's deformation.

公开(公告)号：US10078269B2

公开(公告)日：2018-09-18

申请号：US15283669

申请日：2016-10-03

Applicant: NIKON CORPORATION

Inventor： Eric Peter Goodwin ,  Michael B. Binnard ,  Ruslan Kurdyumov

IPC: G03B27/52 ,  G03B27/54 ,  G03F7/20 ,  G01J1/04 ,  G01N21/47

CPC classification number: G03F7/70141 ,  G01J1/0414 ,  G01J1/0448 ,  G01J1/0477 ,  G01J1/08 ,  G01J1/4209 ,  G01N21/4788 ,  G01N21/4795 ,  G03F7/70775 ,  G03F9/7088

Abstract: System and method for accurately measuring alignment of every exposure field on a pre-patterned wafer without reducing wafer-exposure throughput. Diffraction grating disposed in scribe-lines of such wafer, used as alignment marks, and array of encoder-heads (each of which is configured to define positional phase(s) of at least one such alignment mark) are used. Determination of trajectory of a wafer-stage scanning during the wafer-exposure in the exposure tool employs determining in-plane coordinates of such spatially-periodic alignment marks by simultaneously measuring position-dependent phases of signals produced by these marks as a result of recombination of light corresponding to different diffraction orders produced by these marks. Measurements may be performed simultaneously at all areas corresponding to at least most of the exposure fields of the wafer, and/or with use of a homodyne light source, and/or in a wavelength-independent fashion, and/or with a pre-registration process allowing for accommodation of wafers with differently-dimensioned exposure fields.

公开(公告)号：US20180128653A1

公开(公告)日：2018-05-10

申请号：US15866696

申请日：2018-01-10

Applicant: NIKON CORPORATION

Inventor： Eric Peter Goodwin

IPC: G01D5/26 ,  G01D5/38 ,  G01D5/347 ,  G03F7/20

CPC classification number: G01D5/266 ,  G01D5/34715 ,  G01D5/38 ,  G03F7/70775 ,  H01L21/681

Abstract: An encoder head configured for use with a lithographic exposure tool. The head is devoid of a multiplicity of stand-alone optical retroreflectors. The head includes a single, geometrically substantially perfect optically-isotropic cuboid complemented with optically-isotropic prismatic elements to form a contraption that, in combination with a diffraction grating disposed on a wafer-stage of the exposure tool, splits a single input beam of light delivered to the contraption into four measurement (sub-)beams of light (two in xz-plane, two in yz-plane) and causes each of these sub-beams traverse two prismatic elements and be retro-reflected internally within the cuboid to exit the encoder head at a non-zero angle with respect to the input beam of light, thereby solving problems of (i) structural complexity of a conventional encoder head for use in an exposure tool, (ii) burdensome alignment of the multitude of optical prisms in the process of forming such encoder head, and (iii) cyclic non-linear errors associated with measurements involving conventional corner-cubes-based encoder heads while, at the same time, reducing the geometrical footprint of the encoder head (without reducing the cross-section of the single input beam).

公开(公告)号：US09243896B2

公开(公告)日：2016-01-26

申请号：US13796316

申请日：2013-03-12

Applicant: NIKON CORPORATION

Inventor： Eric Peter Goodwin

IPC: G03B27/54 ,  G03B27/52 ,  G01B11/14 ,  G03F7/20

CPC classification number: G01B11/14 ,  G03F7/70775

Abstract: A measurement system for measuring the position of a work piece (28) includes a stage grating (234) and an encoder head (236). A first measurement beam (38A) is directed at the stage grating (234) at a first angle, the first measurement beam (38A) being at a first wavelength. A second measurement beam (38B) is directed at the stage grating (234) at a second angle that is different than the first angle, the second measurement beam (38B) being at a second wavelength that is different than the first wavelength. At least a portion of the first measurement beam (38A) and at least a portion of the second measurement beam (38B) are interfered with one another to create a measurement signal along a signal axis.

Abstract translation: 用于测量工件（28）的位置的测量系统包括平台光栅（234）和编码器头（236）。 第一测量光束（38A）以第一角度指向舞台光栅（234），第一测量光束（38A）处于第一波长。 第二测量光束（38B）以与第一角度不同的第二角度指向舞台光栅（234），第二测量光束（38B）处于与第一波长不同的第二波长。 第一测量光束（38A）的至少一部分和第二测量光束（38B）的至少一部分彼此干涉以产生沿信号轴的测量信号。

公开(公告)号：US20150268344A1

公开(公告)日：2015-09-24

申请号：US13841021

申请日：2013-03-15

Applicant: NIKON CORPORATION ,  NIKON METROLOGY NV

Inventor： Mina A. Rezk ,  Anthony R. Slotwinski ,  Daniel G. Smith ,  Eric Peter Goodwin ,  Alexander Cooper ,  Thomas M. Hedges

IPC: G01S17/32 ,  G01B9/02 ,  G01S7/481

CPC classification number: G01S17/325 ,  G01B9/02007 ,  G01S7/4812 ,  G01S7/4817 ,  G01S7/4818 ,  G01S7/4917 ,  G01S7/497 ,  G01S17/42 ,  G01S17/66

Abstract: Laser radar systems include a pentaprism configured to scan a measurement beam with respect to a target surface. A focusing optical assembly includes a corner cube that is used to adjust measurement beam focus. Target distance is estimated based on heterodyne frequencies between a return beam and a local oscillator beam. The local oscillator beam is configured to propagate to and from the focusing optical assembly before mixing with the return beam. In some examples, heterodyne frequencies are calibrated with respect to target distance using a Fabry-Perot interferometer having mirrors fixed to a lithium aluminosilicate glass-ceramic tube.

Abstract translation: 激光雷达系统包括配置成相对于目标表面扫描测量光束的五棱镜。 聚焦光学组件包括用于调节测量光束聚焦的角立方体。 基于返回波束和本地振荡器波束之间的外差频率来估计目标距离。 本地振荡器束配置成在与返回光束混合之前传播到聚焦光学组件和/或从聚焦光学组件传播。 在一些示例中，使用具有固定到铝硅酸锂玻璃 - 陶瓷管的镜子的法布里 - 珀罗干涉仪来校准相对于目标距离的外差频率。

公开(公告)号：US20140183345A1

公开(公告)日：2014-07-03

申请号：US14239773

申请日：2012-09-05

Applicant: NIKON CORPORATION

Inventor： Eric Peter Goodwin

IPC: G01D5/34

CPC classification number: G01D5/34 ,  G03F7/70775 ,  H01L21/67259

Abstract: A measurement system (22) for measuring the position of a work piece (28) along a first axis includes a grating (234), and an encoder head (238) that directs a first measurement beam (240) at the grating (234) at a first angle, and directs a second measurement beam (242) at the grating (234) at a second angle. An absolute value of the first angle relative to a normal (244) of the grating (234) is different from an absolute value of the second angle relative to the normal (244) of the grating (234). Additionally, the first measurement beam (240) has a first wavelength, and the second measurement beam (242) has a second wavelength that can be different from the first wavelength. Further, the first measurement beam (240) and the second measurement beam (242) can impinge at approximately the same location on the grating (234).

Abstract translation: 用于测量沿着第一轴线的工件（28）的位置的测量系统（22）包括光栅（234）和引导光栅（234）处的第一测量光束（240）的编码器头（238） 并以第二角度引导光栅（234）处的第二测量光束（242）。 相对于光栅（234）的法线（244）的第一角度的绝对值不同于相对于光栅（234）的法线（244）的第二角度的绝对值。 另外，第一测量光束（240）具有第一波长，并且第二测量光束（242）具有可以与第一波长不同的第二波长。 此外，第一测量光束（240）和第二测量光束（242）可以在光栅（234）上的大致相同的位置处撞击。

公开(公告)号：US20130330662A1

公开(公告)日：2013-12-12

申请号：US13790295

申请日：2013-03-08

Applicant: NIKON CORPORATION

Inventor： Eric Peter Goodwin

IPC: G01J1/42 ,  G01B11/14

CPC classification number: G01J1/42 ,  G01B11/14 ,  G01B11/25 ,  G02B7/36 ,  G03F7/70 ,  G03F7/70725 ,  G03F7/70775 ,  G03F9/7026

Abstract: A detector (550) for detecting light (248B) from a light source (248A) comprises a single array of pixels (574) and a first mask (576). The single array of pixels (574) includes a plurality of rows of pixels (574R), and a plurality of columns of pixels (574C) having at least a first active column of pixels (574AC) and a spaced apart second active column of pixels (574AC). The first mask (576) covers one of the plurality of columns of pixels (574C) to provide a first masked column of pixels (574MC) that is positioned between the first active column of pixels (574AC) and the second active column of pixels (574AC). Additionally, a charge is generated from the light (248B) impinging on the first active column of pixels (574AC), is transferred to the first masked column of pixels (574MC), and subsequently is transferred to the second active column of pixels (574AC).

Abstract translation: 用于从光源（248A）检测光（248B）的检测器（550）包括单个像素阵列（574）和第一掩模（576）。 单个像素阵列（574）包括多行像素（574R），并且多列像素（574C）具有至少第一有源像素列（574AC）和间隔开的第二有源像素列 （574AC）。 第一掩模（576）覆盖多个像素列（574C）中的一个，以提供位于第一有效像素列（574AC）和第二有效像素列（574C）之间的第一被屏蔽的像素列（574MC） 574AC）。 另外，从照射在第一有源像素列（574AC）上的光（248B）产生电荷被传送到第一被屏蔽的像素列（574MC），并且随后被传送到第二有源像素列（574AC ）。