DETERMINATION OF CUSTOMIZED COMPONENTS FOR FITTING WAFER PROFILE

    公开(公告)号:US20200292304A1

    公开(公告)日:2020-09-17

    申请号:US16888235

    申请日:2020-05-29

    Abstract: Method and system for defining basis functions for fitting distortions of profiles of objects in a batch, that has undergone a fabrication process, in a manner adaptable to the fabrication process to reduce the errors between profiles approximated with the use of such basis functions and actual object profiles. Process-specific individual basis functions are defined based on spatially-dense measurement of objects from training sub-set of the batch and applying learning algorithm to results of such measurement. Advantages of process-adaptable basis functions over generic basis functions for fitting distortion shapes of objects include higher accuracy of fitting either at larger or a fewer locations across the object.

    PRECISION CLAMP
    2.
    发明申请
    PRECISION CLAMP 审中-公开
    精密夹

    公开(公告)号:US20150115513A1

    公开(公告)日:2015-04-30

    申请号:US14526326

    申请日:2014-10-28

    CPC classification number: B25B5/16 B25B5/06

    Abstract: A clamp for selectively inhibiting movement of a first object relative to a second object includes (i) a first clamp component coupled to the first object; (ii) a second clamp component coupled to the second object; and (iii) a fluid source that directs a fluid to the second clamp component to create a fluid bearing between the first clamp component and the second clamp component that allows for movement of the first clamp component relative to the second clamp component, and wherein the fluid source directs less fluid to the second clamp component to inhibit relative movement.

    Abstract translation: 用于选择性地抑制第一物体相对于第二物体的运动的夹具包括(i)联接到第一物体的第一夹具部件; (ii)联接到所述第二物体的第二夹具部件; 以及(iii)流体源,其将流体引导到所述第二夹持部件,以在所述第一夹持部件和所述第二夹持部件之间形成允许所述第一夹紧部件相对于所述第二夹紧部件移动的流体支承件, 流体源将较少的流体引导到第二夹持部件以阻止相对运动。

    Determination of customized components for fitting wafer profile

    公开(公告)号:US10718606B2

    公开(公告)日:2020-07-21

    申请号:US15099346

    申请日:2016-04-14

    Abstract: Method and system for defining basis functions for fitting distortions of profiles of objects in a batch, that has undergone a fabrication process, in a manner adaptable to the fabrication process to reduce the errors between profiles approximated with the use of such basis functions and actual object profiles. Process-specific individual basis functions are defined based on spatially-dense measurement of objects from training sub-set of the batch and applying learning algorithm to results of such measurement. Advantages of process-adaptable basis functions over generic basis functions for fitting distortion shapes of objects include higher accuracy of fitting either at larger or a fewer locations across the object.

    Determination of customized components for fitting wafer profile

    公开(公告)号:US11788833B2

    公开(公告)日:2023-10-17

    申请号:US16888235

    申请日:2020-05-29

    CPC classification number: G01B11/24 G03F7/70783 G03F9/7003 G01B2210/56

    Abstract: Method and system for defining basis functions for fitting distortions of profiles of objects in a batch, that has undergone a fabrication process, in a manner adaptable to the fabrication process to reduce the errors between profiles approximated with the use of such basis functions and actual object profiles. Process-specific individual basis functions are defined based on spatially-dense measurement of objects from training sub-set of the batch and applying learning algorithm to results of such measurement. Advantages of process-adaptable basis functions over generic basis functions for fitting distortion shapes of objects include higher accuracy of fitting either at larger or a fewer locations across the object.

    Precision clamp
    5.
    发明授权

    公开(公告)号:US10259104B2

    公开(公告)日:2019-04-16

    申请号:US14526326

    申请日:2014-10-28

    Abstract: A clamp for selectively inhibiting movement of a first object relative to a second object includes (i) a first clamp component coupled to the first object; (ii) a second clamp component coupled to the second object; and (iii) a fluid source that directs a fluid to the second clamp component to create a fluid bearing between the first clamp component and the second clamp component that allows for movement of the first clamp component relative to the second clamp component, and wherein the fluid source directs less fluid to the second clamp component to inhibit relative movement.

    DETERMINATION OF CUSTOMIZED COMPONENTS FOR FITTING WAFER PROFILE
    6.
    发明申请
    DETERMINATION OF CUSTOMIZED COMPONENTS FOR FITTING WAFER PROFILE 审中-公开
    定制波形配置的定制组件的确定

    公开(公告)号:US20160305772A1

    公开(公告)日:2016-10-20

    申请号:US15099346

    申请日:2016-04-14

    CPC classification number: G01B11/24 G01B2210/56 G03F7/70783

    Abstract: Method and system for defining basis functions for fitting distortions of profiles of objects in a batch, that has undergone a fabrication process, in a manner adaptable to the fabrication process to reduce the errors between profiles approximated with the use of such basis functions and actual object profiles. Process-specific individual basis functions are defined based on spatially-dense measurement of objects from training sub-set of the batch and applying learning algorithm to results of such measurement. Advantages of process-adaptable basis functions over generic basis functions for fitting distortion shapes of objects include higher accuracy of fitting either at larger or a fewer locations across the object.

    Abstract translation: 用于定义基本函数的方法和系统,以适应于制造过程的方式对批次中的对象的轮廓进行拟合的失真,该方法适用于制造过程,以减少使用这种基础函数和实际物体近似的轮廓之间的误差 档案。 基于对批次的训练子集的对象的空间密集测量,并将学习算法应用于这种测量的结果来定义过程特定的个体基函数。 过程适应性基础函数优于通用基函数以适应对象的变形形状的优点包括在整个对象上的较大或较少位置拟合更高的精度。

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