公开(公告)号：US20140311525A1

公开(公告)日：2014-10-23

申请号：US14319416

申请日：2014-06-30

Applicant: NITTO DENKO CORPORATION

Inventor： Makoto NAMIKAWA ,  Yoshio TERADA ,  Jirou NUKAGA ,  Eiji TOYODA

IPC: A47L25/00 ,  B08B7/00

CPC classification number: A47L25/005 ,  B08B7/0028 ,  B08B13/00 ,  C11D11/0047 ,  C11D11/0058 ,  H01L21/67028 ,  Y10T156/1075 ,  Y10T428/14 ,  Y10T428/1471 ,  Y10T428/1495 ,  Y10T428/24752

Abstract: A label sheet for cleaning is formed of a label for cleaning including a cleaning layer having a 180° peeling adhesion to a silicon wafer of 0.20 N/10 mm or less after receiving an active energy and an adhesive layer provided on one of surfaces of said cleaning layer, and a separator on which the label is removably provided through the adhesive layer.

Abstract translation: 用于清洁的标签片由用于清洁的标签形成，其包括在接收到活性能之后具有0.20N / 10mm或更小的硅晶片的180°剥离粘合力的清洁层，以及设置在所述第一表面的一个表面上的粘合剂层 清洁层和分隔件，标签通过粘合剂层可拆卸地设置在其上。

公开(公告)号：US20140311666A1

公开(公告)日：2014-10-23

申请号：US14319411

申请日：2014-06-30

Applicant: NITTO DENKO CORPORATION

Inventor： Makoto NAMIKAWA ,  Yoshio TERADA ,  Jirou NUKAGA ,  Eiji TOYODA

IPC: B08B13/00

CPC classification number: A47L25/005 ,  B08B7/0028 ,  B08B13/00 ,  C11D11/0047 ,  C11D11/0058 ,  H01L21/67028 ,  Y10T156/1075 ,  Y10T428/14 ,  Y10T428/1471 ,  Y10T428/1495 ,  Y10T428/24752

Abstract: A label sheet for cleaning is formed of a label for cleaning including a cleaning layer having a 180° peeling adhesion to a silicon wafer of 0.20 N/10 mm or less after receiving an active energy and an adhesive layer provided on one of surfaces of said cleaning layer, and a separator on which the label is removably provided through the adhesive layer.

公开(公告)号：US20140090199A1

公开(公告)日：2014-04-03

申请号：US14038836

申请日：2013-09-27

Applicant: NITTO DENKO CORPORATION

Inventor： Yoshio TERADA ,  Makoto NAMIKAWA ,  Daisuke UENDA ,  Asami FUNATSU

IPC: B08B1/00

CPC classification number: B08B1/006 ,  B08B1/00 ,  B08B7/00 ,  B08B7/0028 ,  C11D3/162 ,  C11D17/049 ,  H05K3/26

Abstract: A cleaning sheet comprising a cleaning layer and a releasable protective film laminated on the cleaning layer, wherein each of the relative intensities of the fragment ions of CH3Si+, C3H9Si+, C5H15Si2O+, C5H15Si3O3+, C7H21Si3O2+, CH3SiO−, CH3SiO2− and Si+ in the cleaning layer, when the protective film is peeled off the cleaning layer, is 0.1 or less according to time-of-flight secondary ion mass spectrometry, relative to C2H3+ in the case of positive ion or O− in the case of negative ion.

Abstract translation: 一种清洁片，其包括层压在所述清洁层上的清洁层和可释放保护膜，其中所述清洁层中的CH 3 Si +，C 3 H 9 Si +，C 5 H 15 Si 2 O +，C 5 H 15 Si 3 O 3 +，C 7 H 21 Si 3 O 2 +，CH 3 SiO - ，CH 3 SiO 2 - 和Si +的碎片离子的相对强度 当保护膜从清洁层剥离时，根据飞行时间二次离子质谱法，在负离子情况下相对于C2H3 +为0.1或更小，在负离子的情况下为0.1。

公开(公告)号：US20140090196A1

公开(公告)日：2014-04-03

申请号：US14039286

申请日：2013-09-27

Applicant: NITTO DENKO CORPORATION

Inventor： Yoshio TERADA ,  Makoto NAMIKAWA ,  Daisuke UENDA ,  Asami FUNATSU

IPC: C11D17/04

CPC classification number: B08B1/006 ,  B08B1/00 ,  B08B7/00 ,  B08B7/0028 ,  C11D3/162 ,  C11D17/049 ,  H05K3/26

Abstract: A cleaning sheet comprising a cleaning layer and a releasable protective film laminated on the cleaning layer, wherein each of the relative intensities of the fragment ions Of CH3Si+, C3H9Si+, C5H15Si2O+, C5H15Si3O3+, CH3SiO−, CH3SiO2− and Si+ in the cleaning layer, when the protective film is peeled off the cleaning layer, is 0.1 or less according to time-of-flight secondary ion mass spectrometry, relative to C2H3+ in the case of positive ion or O− in the case of negative ion.

Abstract translation: 一种清洁片，其包括层压在所述清洁层上的清洁层和可释放保护膜，其中所述清洁层中的CH 3 Si +，C 3 H 9 Si +，C 5 H 15 Si 2 O +，C 5 H 15 Si 3 O 3 +，CH 3 SiO - ，CH 3 SiO 2 - 和Si +的碎片离子的每个相对强度 根据飞行时间二次离子质谱法，保护膜从清洁层剥离，相对于C2H3 +，在负离子的情况下，为0.1以下，在负离子的情况下为O。