SYSTEM AND METHOD FOR ENHANCED INSPECTION OF SURFACES WITH SPECULAR REFLECTION

    公开(公告)号:US20250076183A1

    公开(公告)日:2025-03-06

    申请号:US18239005

    申请日:2023-08-28

    Applicant: Orbotech Ltd.

    Abstract: An inspection system for enhancing diffuse scattering from a sample during inspection of includes a stage and an optical sub-system, wherein the optical sub-system includes an illumination source, one or more optical elements, and a camera. The inspection system also includes one or more fluid delivery nozzles positioned proximate to the stage. The one or more fluid delivery nozzles are configured to deliver a fluid to the one or more reflective components of the sample via a fluid stream to temporarily cause adsorption of a material on a surface of the one or more reflective components of the sample to cause temporary enhancement of diffuse scattering from the one or more reflective components of the sample. The camera is configured to image the one or more reflective components of the sample during the temporary enhancement of diffuse scattering from the one or more reflective components of the sample.

    ENHANCING EFFICIENCY OF RESIST PATTERNING
    2.
    发明公开

    公开(公告)号:US20240255854A1

    公开(公告)日:2024-08-01

    申请号:US18162844

    申请日:2023-02-01

    Applicant: Orbotech Ltd.

    CPC classification number: G03F7/2004

    Abstract: A direct imaging system includes an ultraviolet radiation source, which is configured to irradiate a first area, having a first width, of a layer of a photoreactive material on a substrate with patterned ultraviolet radiation. A thermal energy source is configured to heat a second area of the layer of the photoreactive material while the ultraviolet radiation source irradiates the first area. The second area contains a part of the first area and having a second width less than the first width.

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