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公开(公告)号：US20250137938A1
公开(公告)日：2025-05-01
申请号：US19000945
申请日：2024-12-24
Applicant: Orbotech Ltd.
Inventor： Vered Gatt , Itzhak Saki Hakim , Chay Goldenberg , Mordehay Amirim
IPC: G01N21/956
Abstract: A method for inspection of multiple features of patterned objects in the manufacture of electrical circuits, the method including performing defect detection on the patterned object, employing an optical defect detection machine (ODDM) and employing the ODDM to measure at least one of spatial coordinates and physical attributes of at least some of the multiple features.
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