公开(公告)号：US20230094806A1

公开(公告)日：2023-03-30

申请号：US17768153

申请日：2020-10-15

Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

Inventor： Akira IRIFUNE ,  Shun YAMAGUCHI ,  Fuminori SATOU ,  Tatsuya ARISAWA ,  Mitsuyoshi NISHINO

IPC: B32B15/08 ,  B32B15/20

Abstract: A metal-clad laminate includes an insulating layer that contains a cured product of a resin composition containing a polymer having a structural unit represented by Formula (1) in a molecule and a metal foil that is laminated on the insulating layer and is a metal foil in which a nickel element amount on a surface on a side in contact with the insulating layer and a nickel element amount on the surface when the surface is sputtered for 1 minute at 3 nm/min in terms of SiO2 are each 4.5 at % or less with respect to the total element amount on each surface. In Formula (1), Z represents an arylene group, R1-R3 each independently represent a hydrogen atom or an alkyl group, and R4-R6 each independently represent a hydrogen atom or an alkyl group having 1-6 carbon atoms.

公开(公告)号：US20210395452A1

公开(公告)日：2021-12-23

申请号：US17281866

申请日：2019-09-27

Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

Inventor： Tatsuya ARISAWA ,  Shun YAMAGUCHI ,  Fuminori SATOU ,  Akira IRIFUNE ,  Mitsuyoshi NISHINO

IPC: C08G65/48 ,  C08L71/12 ,  B32B15/08 ,  H05K1/03 ,  H05K1/09

Abstract: A metal-clad laminate includes an insulating layer, and a metal foil in contact with at least one surface of the insulating layer, in which the insulating layer contains a cured product of a resin composition containing a polyphenylene ether compound, and the metal foil is a metal foil in which a first nickel element amount, on a surface on a side in contact with the insulating layer, measured by X-ray photoelectron spectroscopy is 4.5 at % or less with respect to a total element amount measured by X-ray photoelectron spectroscopy, and a second nickel element amount, on a surface on a side in contact with the insulating layer when the surface is sputtered for 1 minute at a speed of 3 nm/min in terms of SiO2, measured by X-ray photoelectron spectroscopy is 4.5 at % or less with respect to a total element amount measured by X-ray photoelectron spectroscopy.