公开(公告)号：US20160319429A1

公开(公告)日：2016-11-03

申请号：US14392405

申请日：2014-11-19

Applicant: PILKINGTON GROUP LIMITED

Inventor： KEVIN DAVID SANDERSON ,  IAN ROSS WILLIAMS ,  DOUGLAS MARTIN NELSON

IPC: C23C16/455 ,  C03C17/00 ,  C23C16/54

Abstract: Apparatus is described for coating of three dimensional objects such as glass jars or bottles, during a continuous manufacturing process, by Chemical Vapour Deposition (CVD). The objects pass through tunnel having one or more vertical arrays of nozzles located in the sidewalls. The nozzles deliver CVD precursors and, being independently variable, allow for variation of the precursor concentration along the height of the object. Thus, the thickness of the resultant coating may be so varied. Preferred embodiments include corresponding exhaust arrays, aligned with the nozzles and one or more air curtains which isolate the interior of the tunnel from the external environment.

Abstract translation: 描述了用于在连续制造过程中通过化学气相沉积（CVD）涂覆三维物体如玻璃罐或瓶子的装置。 物体穿过具有位于侧壁中的一个或多个垂直排列的喷嘴的隧道。 喷嘴提供CVD前体，并且独立地可变地允许沿着物体的高度改变前体浓度。 因此，所得涂层的厚度可以如此变化。 优选实施例包括与喷嘴对准的相应排气阵列和将隧道内部与外部环境隔离的一个或多个气幕。

公开(公告)号：US20210155535A1

公开(公告)日：2021-05-27

申请号：US16640156

申请日：2018-08-31

Applicant: PILKINGTON GROUP LIMITED

Inventor： LILA RAJ DAHAL ,  DOUGLAS MARTIN NELSON ,  JUN NI ,  DAVID ALAN STRICKLER ,  SRIKANTH VARANASI

IPC: C03C17/34 ,  C03C3/087

Abstract: A coated glass article includes a glass substrate. A coating is formed on the glass substrate. The coating includes a first coating layer. The first coating layer includes fluorine doped tin oxide. A second coating layer is provided between the glass substrate and the first coating layer. The second coating layer includes silicon dioxide and at least one of phosphorus and boron. The coated glass article exhibits a haze of 2.0% or less.

公开(公告)号：US20180216231A1

公开(公告)日：2018-08-02

申请号：US15748206

申请日：2016-07-29

Applicant: PILKINGTON GROUP LIMITED

Inventor： IAN ROSS WILLIAMS ,  DEBORAH RAISBECK ,  DOUGLAS MARTIN NELSON ,  KEVIN DAVID SANDERSON

IPC: C23C16/54 ,  C03C17/00 ,  C03C17/245

CPC classification number: C23C16/54 ,  C03C17/005 ,  C03C17/245 ,  C03C17/2456 ,  C03C2217/212 ,  C03C2217/213 ,  C03C2218/152 ,  C23C16/402 ,  C23C16/405

Abstract: Apparatus is described for coating deposition, particularly by chemical vapour deposition, on three dimensional glass articles such as bottles. The apparatus lends itself to incorporation in plant for a continuous production process for glass containers.

公开(公告)号：US20230167556A1

公开(公告)日：2023-06-01

申请号：US18101749

申请日：2023-01-26

Applicant: PILKINGTON GROUP LIMITED

Inventor： IAN ROSS WILLIAMS ,  DEBORAH RAISBECK ,  DOUGLAS MARTIN NELSON ,  KEVIN DAVID SANDERSON

IPC: C23C16/54 ,  C03C17/00 ,  C03C17/245

CPC classification number: C23C16/54 ,  C03C17/005 ,  C03C17/2456 ,  C03C17/245 ,  C03C2217/212 ,  C03C2217/213 ,  C03C2218/152 ,  C23C16/402

Abstract: An apparatus is provided for coating deposition, particularly by chemical vapour deposition, on three-dimensional glass articles such as bottles. The apparatus lends itself to incorporation in a plant for a continuous production process for glass containers.

公开(公告)号：US20210130229A1

公开(公告)日：2021-05-06

申请号：US16640118

申请日：2018-08-31

Applicant: PILKINGTON GROUP LIMITED

Inventor： LILA RAJ DAHAL ,  DOUGLAS MARTIN NELSON ,  JUN NI ,  DAVID ALAN STRICKLER ,  SRIKANTH VARANASI

IPC: C03C17/245 ,  C23C16/40 ,  C23C16/453 ,  C23C16/54

Abstract: A chemical vapor deposition process for forming a silicon oxide coating includes providing a moving glass substrate. A gaseous mixture is formed and includes a silane compound, a first oxygen-containing molecule, a radical scavenger, and at least one of a phosphorus-containing compound and a boron-containing compound. The gaseous mixture is directed toward and along the glass substrate. The gaseous mixture is reacted over the glass substrate to form a silicon oxide coating on the glass substrate at a deposition rate of 150 nm*m/min or more.