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1.发明申请Programmable photolithographic mask based on semiconductor nano-particle optical modulators 失效基于半导体纳米粒子光学调制器的可编程光刻掩模公开(公告)号：US20040150865A1
公开(公告)日：2004-08-05
申请号：US10730381
申请日：2003-12-09
Applicant: Pixelligent Technologies LLC,
Inventor： Zhiyun Chen , Gregory D. Cooper , Serpil Gonen , Erin F. Fleet
IPC: G02F001/03
CPC classification number: G03F7/70383 , B82Y20/00 , G02F1/0126 , G02F1/015 , G02F1/01716 , G02F2202/36 , G02F2203/12 , G03F7/70291 , Y10S430/146 , Y10S977/932 , Y10T428/24802 , Y10T428/24893
Abstract: Nano-particles are provided with control circuitry to form a programmable mask. The optical characteristics of the nano-particles change to provide patterned light. Such patterned light can be used for example to expose a photoresist on a semiconductor wafer for photolithography.
Abstract translation: 纳米颗粒设置有控制电路以形成可编程掩模。 纳米颗粒的光学特性改变以提供图案化的光。 这种图案化的光可以用于例如在半导体晶片上曝光用于光刻的光致抗蚀剂。
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2.发明申请Reversible photobleachable materials based on nano-sized semiconductor particles and their optical applications 失效基于纳米尺寸半导体颗粒的可逆光可漂白材料及其光学应用公开(公告)号：US20040152011A1
公开(公告)日：2004-08-05
申请号：US10730382
申请日：2003-12-09
Applicant: Pixelligent Technologies LLC
Inventor： Zhiyun Chen , Erin F. Fleet , Serpil Gonen , Gregory D. Cooper
IPC: G03F007/00
CPC classification number: G03F7/70383 , B82Y20/00 , G02F1/0126 , G02F1/015 , G02F1/01716 , G02F2202/36 , G02F2203/12 , G03F7/70291 , Y10S430/146 , Y10S977/932 , Y10T428/24802 , Y10T428/24893
Abstract: Semiconductor nano-particles, due to their specific physical properties, can be used as reversible photo-bleachable materials for a wide spectrum, from far infrared to deep UV. Applications include, reversible contrast enhancement layer (R-CEL) in optical lithography, lithography mask inspection and writing and optical storage technologies.
Abstract translation: 由于其特定的物理特性，半导体纳米颗粒可用作从远红外线到深紫外线的广泛光可逆漂白材料。 应用包括光学光刻中的可逆对比度增强层（R-CEL），光刻掩模检查和写入以及光学存储技术。
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3.发明申请公开(公告)号：US20020061472A1
公开(公告)日：2002-05-23
申请号：US09988216
申请日：2001-11-19
Applicant: Pixelligent Technologies LLC.
Inventor： Gregory D. Cooper , Erin F. Fleet
IPC: G03F007/20
CPC classification number: G03F7/70416 , G03F7/0037 , G03F7/70291
Abstract: Two programmable masks are used for the exposure of three-dimensional patterns in a photosensitive material. This exposure technique takes advantages of symmetries and repeating structures in the exposure pattern to reduce the exposure time, while maintaining the flexibility to produce complicated three-dimensional shapes.
Abstract translation: 使用两个可编程掩模来曝光感光材料中的三维图案。 该曝光技术具有曝光图案中的对称性和重复结构的优点，以减少曝光时间，同时保持产生复杂三维形状的灵活性。
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