公开(公告)号：US20230400423A1

公开(公告)日：2023-12-14

申请号：US18034886

申请日：2021-11-01

Applicant: Rigaku Corporation

Inventor： Makoto KAMBE ,  Kazuhiko OMOTE ,  Toshifumi HIGUCHI ,  Tsutomu TADA ,  Hajime FUJIMURA ,  Masahiro NONOGUCHI ,  Licai JIANG ,  Boris VERMAN ,  Yuriy PLATONOV

IPC: G01N23/223

CPC classification number: G01N23/223

Abstract: Provided is a total reflection X-ray fluorescence spectrometer which has high analysis sensitivity and analysis speed. The total reflection X-ray fluorescence spectrometer includes: an X-ray source that has an electron beam focal point having an effective width in a direction parallel to a surface of a sample, and orthogonal to an X-ray irradiation direction, that is larger than a dimension in the irradiation direction; a reflective optic that has an effective width in the orthogonal direction that is larger than that of the electron beam focal point, and has a curved surface in the irradiation direction; and a plurality of detectors that are arranged in a row in the orthogonal direction, and are configured to measure intensities of fluorescent X-rays emitted from the sample irradiated with primary X-rays focused by the reflective optic.

公开(公告)号：US20140105367A1

公开(公告)日：2014-04-17

申请号：US14055453

申请日：2013-10-16

Applicant: RIGAKU CORPORATION

Inventor： Martin HORVARTH ,  Jiri MARSIK ,  Ladislav PINA ,  Vaclav JELINEK ,  Naohisa OSAKA ,  Kazuhiko OMOTE ,  Makoto KAMBE ,  Licai JIANG ,  Bonglea KIM

IPC: H01J35/14

CPC classification number: H01J35/14 ,  H01J2235/081 ,  H01J2235/083

Abstract: The X-ray generating apparatus 100 applies an electron beam e1 onto a target 150 to generate X-rays x1, and includes a permanent magnet lens 120 configured to focus the electron beam e1, a correction coil 130 provided on a side of the electron beam e1 with respect to the permanent magnet lens 120 and configured to correct a focus position formed by the permanent magnet lens 120 in a traveling direction of the electron beam e1, and a target 150 onto which the focused electron beam is applied. Accordingly, the apparatus configuration can be extremely compact and lightweight in comparison with general apparatuses. Furthermore, by the correction coil 130, the intensity of the magnetic field can be finely adjusted and the focus position in the traveling direction of the electron beam e1 can be finely adjusted.

Abstract translation: X射线产生装置100将电子束e1施加到靶150上以产生X射线x1，并且包括被配置为聚焦电子束e1的永磁体透镜120，设置在电子束侧的校正线圈130 e1相对于永磁体透镜120，并且被配置为在电子束e1的行进方向上校正由永久磁铁透镜120形成的聚焦位置，以及被施加聚焦电子束的目标150。 因此，与一般装置相比，装置结构可以非常紧凑和重量轻。 此外，通过校正线圈130，可以精细地调节磁场的强度，并且可以精细地调整电子束e1的行进方向上的聚焦位置。