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    Method Of Manufacturing A Patterned Transparent Conductor
    1.
    发明申请
    Method Of Manufacturing A Patterned Transparent Conductor 有权
    图案化透明导体的制造方法

    公开(公告)号：US20140290979A1

    公开(公告)日：2014-10-02

    申请号：US13854292

    申请日：2013-04-01

    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

    Inventor： Jake Joo ,  Jerome Claracq ,  Sylvie Vervoort ,  Mubasher Bashir ,  Peter Trefonas ,  Garo Khanarian ,  Kathleen O'Connell

    IPC: H05K1/02 ,  H05K3/06

    CPC classification number: H05K1/0274 ,  G06F2203/04103 ,  G06F2203/04112 ,  H05K3/0079 ,  H05K3/061 ,  H05K3/067 ,  H05K9/0084 ,  H05K2201/0108 ,  H05K2201/0278

    Abstract: Method of manufacturing patterned conductor is provided, comprising: providing a conductivised substrate, wherein the conductivised substrate comprises a substrate and an electrically conductive layer; providing an electrically conductive layer etchant; providing a spinning material; providing a masking fiber solvent; forming a plurality of masking fibers and depositing the plurality of masking fibers onto the electrically conductive layer; exposing the electrically conductive layer to the electrically conductive layer etchant, wherein the electrically conductive layer that is uncovered by the plurality of masking fibers is removed from the substrate, leaving an interconnected conductive network on the substrate covered by the plurality of masking fibers; and, exposing the plurality of masking fibers to the masking fiber solvent, wherein the plurality of masking fibers are removed to uncover the interconnected conductive network on the substrate.

    Abstract translation: 提供制造图案化导体的方法，包括：提供导电基底，其中所述电导基底包括基底和导电层; 提供导电层蚀刻剂; 提供纺纱材料; 提供掩蔽纤维溶剂; 形成多个掩模光纤，并将多个掩模光纤沉积到导电层上; 将所述导电层暴露于所述导电层蚀刻剂，其中由所述多个掩蔽光纤未覆盖的所述导电层从所述衬底移除，在由所述多个掩蔽光纤覆盖的所述衬底上留下互连的导电网络; 以及将所述多个屏蔽纤维暴露于掩蔽纤维溶剂中，其中去除所述多个掩蔽纤维以露出所述基底上的所述互连的导电网络。

    METHODS FOR MAKING IMPROVED QUANTUM DOT RESIN FORMULATIONS
    3.
    发明申请
    METHODS FOR MAKING IMPROVED QUANTUM DOT RESIN FORMULATIONS 审中-公开

    公开(公告)号：US20180230377A1

    公开(公告)日：2018-08-16

    申请号：US15880879

    申请日：2018-01-26

    Applicant: Rohm and Haas Electronic Materials LLC ,  Dow Global Technologies LLC

    Inventor： Liang Chen ,  Leslie E. O'Leary ,  Zhifeng Bai ,  Yuming Lai ,  Jake Joo

    IPC: C09K11/02 ,  C09K11/88 ,  C09K11/70 ,  C08F220/16 ,  C09D5/22 ,  C09D5/24 ,  C09D133/06 ,  B01D15/08

    Abstract: The present invention provides methods for making polymerizable monomer compositions comprising purifying a (b) monomer mixture of (i) one or more monomers having at least two polymerizable vinyl groups and (ii) one or more monomers having a single polymerizable vinyl group as part of a (meth)acrylate ester group by any one or more of treating the monomer mixture in an activated porous alumina or silica column, sieve drying the monomer mixture in a vacuum followed by drying over dried molecular sieves having average pore sizes of from 2 to 20 Angstroms, freeze-pump-thaw (FPT) treating by freezing the monomer mixture in a vessel or container to a temperature below −75° C., degassing the monomer mixture by application of vacuum in the range of 102 to 10−2 Pa, sealing the vessel or container under vacuum, and thawing the composition to room temperature; and, combining in an inert gas atmosphere the resulting monomer mixture (b) with a composition (a) of quantum dots in dry form or organic solvent solution.

    Method of manufacturing a patterned transparent conductor
    7.
    发明授权
    Method of manufacturing a patterned transparent conductor 有权
    图案化透明导体的制造方法

    公开(公告)号：US09066425B2

    公开(公告)日：2015-06-23

    申请号：US13854292

    申请日：2013-04-01

    Applicant: Rohm and Haas Electronic Materials LLC

    Inventor： Jake Joo ,  Jerome Claracq ,  Sylvie Vervoort ,  Mubasher Bashir ,  Peter Trefonas ,  Garo Khanarian ,  Kathleen O'Connell

    IPC: C03C25/68 ,  H05K1/02 ,  H05K3/06 ,  H05K9/00 ,  H05K3/00

    CPC classification number: H05K1/0274 ,  G06F2203/04103 ,  G06F2203/04112 ,  H05K3/0079 ,  H05K3/061 ,  H05K3/067 ,  H05K9/0084 ,  H05K2201/0108 ,  H05K2201/0278

    Abstract: Method of manufacturing patterned conductor is provided, comprising: providing a conductivized substrate, wherein the conductivized substrate comprises a substrate and an electrically conductive layer; providing an electrically conductive layer etchant; providing a spinning material; providing a masking fiber solvent; forming a plurality of masking fibers and depositing the plurality of masking fibers onto the electrically conductive layer; exposing the electrically conductive layer to the electrically conductive layer etchant, wherein the electrically conductive layer that is uncovered by the plurality of masking fibers is removed from the substrate, leaving an interconnected conductive network on the substrate covered by the plurality of masking fibers; and, exposing the plurality of masking fibers to the masking fiber solvent, wherein the plurality of masking fibers are removed to uncover the interconnected conductive network on the substrate.

    Abstract translation: 提供制造图案化导体的方法，包括：提供导电基底，其中所述导电基底包括基底和导电层; 提供导电层蚀刻剂; 提供纺纱材料; 提供遮蔽纤维溶剂; 形成多个掩模光纤，并将多个掩模光纤沉积到导电层上; 将所述导电层暴露于所述导电层蚀刻剂，其中由所述多个掩蔽光纤未覆盖的所述导电层从所述衬底移除，在由所述多个掩蔽光纤覆盖的所述衬底上留下互连的导电网络; 以及将所述多个屏蔽纤维暴露于掩蔽纤维溶剂中，其中去除所述多个掩蔽纤维以露出所述基底上的所述互连的导电网络。

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