公开(公告)号：US20060245094A1

公开(公告)日：2006-11-02

申请号：US11117490

申请日：2005-04-29

Applicant: Nora-Jean Harned ,  Richard Gontin ,  Robert Harned ,  Azat Latypov ,  Stanislav Smirnov

Inventor： Nora-Jean Harned ,  Richard Gontin ,  Robert Harned ,  Azat Latypov ,  Stanislav Smirnov

IPC: G02B7/00

CPC classification number: G02B27/0012

Abstract: An embodiment of the present invention provides a method for designing optical surfaces. According to this method, m optical surfaces are defined, such that each successive optical surface receives a wavefront from a previous optical surface. Wavefront aberrations caused by each optical surface are calculated. The changes at each respective optical surface required to compensate for the wavefront aberration caused by the respective optical surfaces are then calculated. A desired optical profile for each of the m optical surfaces is determined in accordance with the calculated changes to each respective optical surface.

Abstract translation: 本发明的实施例提供了一种用于设计光学表面的方法。 根据该方法，定义m个光学表面，使得每个连续的光学表面从先前的光学表面接收波前。 计算由每个光学表面引起的波前像差。 然后计算补偿由各个光学表面引起的波前像差所需的每个相应的光学表面的变化。 根据对每个相应的光学表面的计算的改变来确定每个m个光学表面的期望的光学轮廓。

公开(公告)号：US20050248743A1

公开(公告)日：2005-11-10

申请号：US11183847

申请日：2005-07-19

Applicant: Walter Augustyn ,  Richard Gontin

Inventor： Walter Augustyn ,  Richard Gontin

IPC: G21K1/06 ,  G02B5/02 ,  G02B5/08 ,  G02B5/18 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/706 ,  G02B5/1838

Abstract: An electromagnetic radiation diffuser, operative at extreme ultraviolet (EUV) wavelengths, is fabricated on a substrate. The diffuser comprises a randomized structure having a peak and valley profile over which a highly reflective coating is formed. The reflective coating substantially takes the form of the peak and valley profile beneath it. An absorptive grating can be fabricated over the reflective coating. The grating spaces will diffusely reflect electromagnetic radiation because of the profile of the randomized structure beneath. The absorptive grating will absorb the electromagnetic radiation. The grating thus becomes a specialized Ronchi ruling that may be used for wavefront evaluation and other optical diagnostics in extremely short wavelength reflective lithography systems, such as EUV lithography systems.

Abstract translation: 在基板上制造在极紫外（EUV）波长下工作的电磁辐射漫射器。 扩散器包括具有峰和谷分布的随机化结构，在其上形成高反射涂层。 反射涂层基本上呈现在其下面的峰和谷轮廓的形式。 可以在反射涂层上制造吸收光栅。 由于下面的随机化结构的轮廓，光栅空间将漫反射电磁辐射。 吸收光栅将吸收电磁辐射。 因此，光栅成为专门的Ronchi规则，可用于波长极端评估和其他光学诊断技术在极短波长反射光刻系统（如EUV光刻系统）中。

公开(公告)号：US5844685A

公开(公告)日：1998-12-01

申请号：US692933

申请日：1996-07-30

Applicant: Richard Gontin

Inventor： Richard Gontin

IPC: G01N15/14 ,  G01N21/00

CPC classification number: G01N15/1436 ,  G01N15/1459 ,  G01N2015/1447 ,  G01N2201/0633

Abstract: Apparatus for sampling a laser beam used in an analytical instrument, e.g., a clinical hematology or flow cytometer instrument, for measuring absorption by particles suspended in a stream moving through a flow cell. The laser beam is typically passed through a mask, e.g., a beam shaping aperture, to shape the beam. The shaped beam is then passed through a beam splitter, located downstream of the beam shaping aperture, so that one part of the shaped beam strikes the flow cell (e.g., is focused onto the moving stream of particles), and a second part is diverted to obtain a reference measurement of the beam about to strike the flow cell. An absorption measurement is obtained of the light passing through the flow cell, and a difference circuit is used to obtain a difference signal relating the differences between the measured absorption and the unabsorbed reference sample of the initial beam intensity. The laser source may be a laser diode and a spatial filter may be used to produce the laser beam to be passed through the beam shaping aperture.

Abstract translation: 用于采样分析仪器例如临床血液学或流式细胞仪器的激光束的装置，用于测量悬浮在移动通过流动池的流中的颗粒的吸收。 激光束通常通过掩模，例如光束整形孔，以形成光束。 成形的光束然后通过位于光束成形孔的下游的分束器，使得成形光束的一部分撞击流动池（例如，聚焦在移动的颗粒物流上），并且第二部分被转向 以获得要撞击流动池的梁的参考测量。 获得通过流通池的光的吸收测量，并且使用差分电路来获得与测量的吸收和未吸收的参考样品之间的初始束强度的差异相关的差分信号。 激光源可以是激光二极管，并且可以使用空间滤光器来产生要通过光束整形孔的激光束。

公开(公告)号：US20060256349A1

公开(公告)日：2006-11-16

申请号：US11391378

申请日：2006-03-29

Applicant: Richard Gontin ,  Yuli Vladimirsky

Inventor： Richard Gontin ,  Yuli Vladimirsky

IPC: G01B9/02

CPC classification number: G01J9/0215 ,  G02B5/1838 ,  G03F7/706

Abstract: A wavefront measurement system has a source of electromagnetic radiation. An imaging system focuses the electromagnetic radiation at an object plane. A first grating is positioned in the object plane and has a plurality of rulings with randomized height. A stage moves the first grating parallel to the rulings. A projection optical system projects an image of the first grating onto an image plane. A second grating is at the image plane. A detector behind the second grating receives a fringe pattern produced by the second grating.