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公开(公告)号：US09772183B2
公开(公告)日：2017-09-26
申请号：US14409756
申请日：2013-06-27
Applicant: Rudolph Technologies Inc.
Inventor： Wojciech Stefanczyk , James Francis Kane , Michael Colgan , James Abondolo
CPC classification number: G01B21/047 , G01B11/005
Abstract: The present disclosure provides a system and method of optical inspection of substrates that have relative large variations in topography. The present disclosure provides a system wherein optical components of the optical inspection system can be automatically moved vertically towards or away from the substrate during optical inspection of the substrate. The system moves the optics in a controlled and precise manner, thereby enabling accurate on-the-fly inspection of substrates having a large variation in topography.
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