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1.
公开(公告)号:US20190155121A1
公开(公告)日:2019-05-23
申请号:US16250802
申请日:2019-01-17
Applicant: SAGE ELECTROCHROMICS, INC.
Inventor: Sophie BROSSARD
Abstract: An electrochromic device can include a substrate, a transparent conductive oxide layer over the substrate, and a bus bar over the substrate. The bus bar can include silver and has a resistivity of at most 6.7×10−6 Ω*cm, an average adhesion strength to SiO2 of at least 3N based on 20 measurements, as determined by Method A of ASTM B905-00 (Reapproved 2010), or a classification of at least 4, as determined by Method B of ASTM B905-00 (Reapproved 2010). In another aspect a process of forming an electrochromic device can include forming a transparent conductive oxide layer over a substrate; forming a bus bar precursor over the substrate, wherein the precursor includes silver; and firing the precursor to form a bus bar. Firing can be performed such that the first bus bar is at a temperature of at least 390° C.
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2.
公开(公告)号:US20190243205A1
公开(公告)日:2019-08-08
申请号:US16385783
申请日:2019-04-16
Applicant: SAGE ELECTROCHROMICS, INC.
Inventor: Sophie BROSSARD , Jean-Christophe GIRON , Charles LEYDER , João ABREU
CPC classification number: G02F1/1533 , C03C17/36 , C03C17/3618 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C2218/322 , C03C2218/326 , G02F1/155 , G02F2001/1536 , G02F2001/1555
Abstract: An electrochromic device can include a substrate; an electrochromic layer or a counter electrode layer over the substrate and including a mobile ion; a first transparent conductive layer over the substrate and including Ag. In one embodiment, the electrochromic device can include a barrier layer disposed between first transparent conductive layer and the electrochromic or counter electrode layer. In another embodiment, the electrochromic device can include means for preventing (1) the mobile ion from migrating into the first transparent conductive layer, (2) Ag from migrating into the electrochromic layer or counter electrode layer, or both (1) and (2). A process of forming an electrochromic device can include forming an electrochromic layer or a counter electrode layer over a substrate; forming a barrier layer; and forming a first transparent conductive layer over the substrate.
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3.
公开(公告)号:US20170322473A1
公开(公告)日:2017-11-09
申请号:US15586897
申请日:2017-05-04
Applicant: SAGE ELECTROCHROMICS, INC.
Inventor: Sophie BROSSARD , Jean-Christophe GIRON , Charles LEYDER , João ABREU
CPC classification number: G02F1/1533 , C03C17/36 , C03C17/3618 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C2218/322 , C03C2218/326 , G02F1/155 , G02F2001/1536 , G02F2001/1555
Abstract: An electrochromic device can include a substrate; an electrochromic layer or a counter electrode layer over the substrate and including a mobile ion; a first transparent conductive layer over the substrate and including Ag. In one embodiment, the electrochromic device can include a barrier layer disposed between first transparent conductive layer and the electrochromic or counter electrode layer. In another embodiment, the electrochromic device can include means for preventing (1) the mobile ion from migrating into the first transparent conductive layer, (2) Ag from migrating into the electrochromic layer or counter electrode layer, or both (1) and (2). A process of forming an electrochromic device can include forming an electrochromic layer or a counter electrode layer over a substrate; forming a barrier layer; and forming a first transparent conductive layer over the substrate.
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4.
公开(公告)号:US20170299934A1
公开(公告)日:2017-10-19
申请号:US15487133
申请日:2017-04-13
Applicant: SAGE ELECTROCHROMICS, INC.
Inventor: Sophie BROSSARD
IPC: G02F1/163 , G02F1/153 , H01R25/14 , G02F1/1345
CPC classification number: G02F1/163 , B32B17/10385 , B32B17/10513 , G02F1/1345 , G02F1/15 , G02F1/1523 , G02F1/1533 , G02F1/155 , G02F2001/1536 , G02F2201/50 , G02F2201/501 , G02F2201/508 , G09G3/38 , H01R25/14 , H01R25/145
Abstract: An electrochromic device can include a substrate, a transparent conductive oxide layer over the substrate, and a bus bar over the substrate. The bus bar can include silver and has a resistivity of at most 6.7×10−6 Ω*cm, an average adhesion strength to SiO2 of at least 3N based on 20 measurements, as determined by Method A of ASTM B905-00 (Reapproved 2010), or a classification of at least 4, as determined by Method B of ASTM B905-00 (Reapproved 2010). In another aspect a process of forming an electrochromic device can include forming a transparent conductive oxide layer over a substrate; forming a bus bar precursor over the substrate, wherein the precursor includes silver; and firing the precursor to form a bus bar. Firing can be performed such that the first bus bar is at a temperature of at least 390° C.
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