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公开(公告)号:US20160069929A1
公开(公告)日:2016-03-10
申请号:US14783403
申请日:2013-04-17
Applicant: SEAGATE TECHNOLOGY LLC
Inventor: Gennady Gauzner , Zhaoning Yu , Nobuo Kurataka , David S. Kuo , Kim Y. Lee , Yautzong Hsu , Hong Ying Wang
CPC classification number: G01Q40/02 , G01N21/01 , G01N2201/13 , G01Q40/00 , G03F7/0002 , H01J37/261 , H01J37/263 , H01J2237/2602 , H01J2237/2826
Abstract: Provided herein in an apparatus, including a substrate; a functional layer, wherein the functional layer has a composition characteristic of a workpiece of an analytical apparatus; and pre-determined features configured to calibrate the analytical apparatus. Also provided herein is an apparatus, including a functional layer overlying a substrate; and pre-determined features for calibration of an analytical apparatus configured to measure the surface of a workpiece, wherein the functional layer has a composition similar to the workpiece. Also provided herein is a method, including providing a lithographic calibration standard having a functional layer to an analytical apparatus, wherein the functional layer has a composition characteristic of a workpiece of the analytical apparatus; providing calibration standard specifications to a computer interfaced with the analytical apparatus; and calibrating the analytical apparatus in accordance with calibration standard readings and the calibration standard specifications.
Abstract translation: 本文提供的装置包括基板; 功能层,其中所述功能层具有分析装置的工件的成分特征; 以及配置成校准分析装置的预定特征。 本文还提供了一种装置,包括覆盖衬底的功能层; 以及用于校准配置成测量工件表面的分析装置的预定特征,其中所述功能层具有类似于所述工件的组成。 本文还提供了一种方法,包括向分析装置提供具有功能层的光刻校准标准,其中功能层具有分析装置的工件的成分特征; 向与分析仪器连接的计算机提供校准标准规格; 并根据校准标准读数和校准标准规格校准分析仪器。
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公开(公告)号:US09797924B2
公开(公告)日:2017-10-24
申请号:US14783403
申请日:2013-04-17
Applicant: SEAGATE TECHNOLOGY LLC
Inventor: Gennady Gauzner , Zhaoning Yu , Nobuo Kurataka , David S. Kuo , Kim Y Lee , Yautzong Hsu , Hong Ying Wang
CPC classification number: G01Q40/02 , G01N21/01 , G01N2201/13 , G01Q40/00 , G03F7/0002 , H01J37/261 , H01J37/263 , H01J2237/2602 , H01J2237/2826
Abstract: Provided herein in an apparatus, including a substrate; a functional layer, wherein the functional layer has a composition characteristic of a workpiece of an analytical apparatus; and pre-determined features configured to calibrate the analytical apparatus. Also provided herein is an apparatus, including a functional layer overlying a substrate; and pre-determined features for calibration of an analytical apparatus configured to measure the surface of a workpiece, wherein the functional layer has a composition similar to the workpiece. Also provided herein is a method, including providing a lithographic calibration standard having a functional layer to an analytical apparatus, wherein the functional layer has a composition characteristic of a workpiece of the analytical apparatus; providing calibration standard specifications to a computer interfaced with the analytical apparatus; and calibrating the analytical apparatus in accordance with calibration standard readings and the calibration standard specifications.
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