Optoelectronic Semiconductor Structure
    1.
    发明公开

    公开(公告)号:US20240234618A1

    公开(公告)日:2024-07-11

    申请号:US18140692

    申请日:2023-04-28

    Inventor: Ching-Kuan Chiu

    CPC classification number: H01L31/1136

    Abstract: The present invention provides an optoelectronic semiconductor structure, which comprises a first-type semiconductor substrate, a second-type semiconductor light-receiving region, and a second-type semiconductor conduction region. The first-type semiconductor substrate includes a top surface. The second-type semiconductor conduction region is used to conduct a photocurrent. The second-type semiconductor light-receiving region is located on the periphery of the second-type semiconductor conduction region. The second-type semiconductor conduction region and the second-type semiconductor light-receiving region are spaced by a distance. By dividing into the semiconductor conduction region and the light-receiving region, the effect of reducing the junction capacitance while maintaining the light-receiving capability can be achieved and thus further enhancing the photoelectric conversion efficiency of the optoelectronic semiconductor structure.

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