公开(公告)号：US20210292469A1

公开(公告)日：2021-09-23

申请号：US17263596

申请日：2019-08-16

Applicant: SHOWA DENKO K.K.

Inventor： Norihito NISHIMURA ,  Katsutoshi OHNO

IPC: C08G18/81 ,  C07C265/06 ,  C07D251/34 ,  C08G18/38

Abstract: A composition is provided including a compound (A) represented by Formula (1) and a compound (B) represented by Formula (2), wherein the compound (B) is contained in an amount of 0.00002 to 0.2 parts by mass with respect to 100 parts by mass of the compound (A): (R1—COO)n—R2—(NCO)m   (1) (in Formula (1), R1 is an ethylenically unsaturated group having 2 to 7 carbon atoms; R2 is an (m+n)-valent hydrocarbon group having 1 to 7 carbon atoms; and n and m are each an integer of 1 or 2) (in Formula (2), R is (—R2—(OCO—R1), and R1 and R2 are the same as those in Formula (1)).

公开(公告)号：US20210198184A1

公开(公告)日：2021-07-01

申请号：US17269386

申请日：2019-08-16

Applicant: SHOWA DENKO K.K.

Inventor： Norihito NISHIMURA ,  Katsutoshi OHNO

IPC: C07C251/38 ,  C08G18/48 ,  C08G18/81 ,  C08G18/08 ,  C07D231/12

Abstract: The invention relates to a composition excellent in stability during storage and stability during utilization, and relates to a method of producing the composition. The composition includes a compound (A) represented by general formula (1) and a compound (B) represented by general formula (2), and includes 0.00002 to 0.2 parts by mass of the compound (B) with respect to 100 parts by mass of the compound (A), (R1—COO)n—R2—(NCO)m  (1) (R1—COO)n—R2—(R3—R1)m  (2) wherein in general formulae (1) and (2), R1 is an ethylenically unsaturated group having 2 to 7 carbon atoms; R2 is a (m+n)-valent hydrocarbon group having 1 to 7 carbon atoms and optionally contains an ether group; R1 and R2 in the general formula (1) are the same as R1 and R2 in the general formula (2); in general formula (2), R3 is —NHC(═O)—; and n and m each represent an integer of one or two.

公开(公告)号：US20220119585A1

公开(公告)日：2022-04-21

申请号：US17269147

申请日：2019-08-16

Applicant: SHOWA DENKO K.K.

Inventor： Norihito NISHIMURA ,  Katsutoshi OHNO

IPC: C08G18/81 ,  C08G18/28 ,  C08G18/80 ,  C08G18/48 ,  C08G18/10

Abstract: The composition comprises a compound (A) represented by general formula (1) and a compound (B) represented by general formula (2), and comprises 0.00002 to 2.0 parts by mass of the compound (B) with respect to 100 parts by mass of the compound (A), (R1—COO)n—R2—(NCO)m   (1) g(R1—COO)n—R2—NHC(═O)NH—R2—(OCO—R1)m   (2) wherein in general formulae (1) and (2), R1 is an ethylenically unsaturated group having 2 to 7 carbon atoms; R2 is a (m+n)-valent hydrocarbon group having 1 to 7 carbon atoms and optionally contain an ether group; R1 and R2 in the general formula (1) are the same as R1 and R2 in the general formula (2); and n and m each represent an integer of one or two.

公开(公告)号：US20210276943A1

公开(公告)日：2021-09-09

申请号：US17269059

申请日：2019-08-16

Applicant: SHOWA DENKO K.K.

Inventor： Norihito NISHIMURA ,  Katsutoshi OHNO

IPC: C07C249/04 ,  C08K5/29 ,  C08L75/04 ,  C07D231/12

Abstract: The invention is related to a composition excellent in stability during storage and excellent stability during utilization, and related to a method of producing the composition. The composition comprises a compound (A) represented by general formula (1) and a compound (B). The compound (B) is an oligomer in which two or more molecules of the compound (A) are bonded to each other by ethylenically unsaturated groups of each compound (A). The composition contains 0.00002 to 0.2 parts by mass of the compound (B) with respect to 100 parts by mass of the compound (A), (R1—COO)n—R2—(NCO)m  (1) wherein in general formula (1), R1 is an ethylenically unsaturated group having 2 to 7 carbon atoms; R2 is a (m+n)-valent hydrocarbon group having 1 to 7 carbon atoms and optionally contain an ether group; and n and in each represent an integer of one or two.