公开(公告)号：US20220380704A1

公开(公告)日：2022-12-01

申请号：US17774025

申请日：2020-10-23

Applicant: SHOWA DENKO K.K.

Inventor： Susumu NAKAZAKI ,  Kuniaki MIYAHARA

IPC: C11D7/32 ,  C11D11/00 ,  C11D7/26

Abstract: Provided is a method for producing a decomposing/cleaning composition which improves etching speed retention. A method for producing a decomposing/cleaning composition which contains (A) an N-substituted amide compound in which a hydrogen atom is not directly bonded to a nitrogen atom and (B) a quaternary alkyl ammonium fluoride or a hydrate thereof, said method having a preparation step for mixing the (A) and (B) components in an inert gas atmosphere.

公开(公告)号：US20220119739A1

公开(公告)日：2022-04-21

申请号：US17420569

申请日：2019-10-31

Applicant: SHOWA DENKO K.K.

Inventor： Susumu NAKAZAKI ,  Kuniaki MIYAHARA ,  Tomoyuki FUKUYO

IPC: C11D7/50 ,  C11D11/00 ,  C11D7/32 ,  C11D7/34 ,  H01L21/02 ,  B08B3/08

Abstract: Provided is a decomposing/cleaning composition for an adhesive polymer having a high etching rate and suppressed infiltration into a contact interface between a substrate such as a device wafer and an adhesive layer such as a fixing tape. The decomposing/cleaning composition of one embodiment is a decomposing/cleaning composition for an adhesive polymer containing a quaternary alkylammonium fluoride or a quaternary alkylammonium fluoride hydrate and an aprotic solvent, wherein the aprotic solvent contains (A) an N-substituted amide compound having no active hydrogens on the nitrogen atoms and (B) at least one organic sulfur oxide selected from the group consisting of sulfoxide compounds and sulfone compounds.

公开(公告)号：US20210317390A1

公开(公告)日：2021-10-14

申请号：US17269692

申请日：2019-09-26

Applicant: SHOWA DENKO K.K.

Inventor： Susumu NAKAZAKI ,  Kuniaki MIYAHARA ,  Tomoyuki FUKUYO

IPC: C11D7/32 ,  C11D7/50 ,  C11D11/00

Abstract: Provided is a composition having high affinity for the surface of an adhesive, and excellent long-term storage stability. This composition comprises: a quaternary alkylammonium fluoride or a hydrate of a quaternary alkylammonium fluoride; and an aprotic solvent, wherein the aprotic solvent includes (A) an N-substituted amide compound having 4 or more carbon atoms and not containing active hydrogen on a nitrogen atom, and (B) an ether compound.