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公开(公告)号:US20210371386A1
公开(公告)日:2021-12-02
申请号:US16322649
申请日:2017-07-28
Applicant: SOLVAY SA
Inventor: Janis JAUNZEMS
IPC: C07D231/14 , C07C241/02 , C07D231/12
Abstract: The present invention concerns the manufacture of hydrazinyl compounds useful in the manufacture of pyrazole carboxylic acid and derivatives thereof and processes for the manufacture of agrochemical or pharmaceutical compounds. The invention also concerns hydrazinyl compounds and their use.
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公开(公告)号:US20210179563A1
公开(公告)日:2021-06-17
申请号:US16771049
申请日:2018-12-20
Applicant: SOLVAY SA
Inventor: Etienne SCHMITT , Alexander SCHULZ , Janis JAUNZEMS
IPC: C07D231/14 , C07C249/16 , C07D231/12
Abstract: Process for the manufacture of iminium compounds and their application in the manufacture of pyrazole derivatives The present invention concerns processes for the manufacture of iminium compounds and their application in the manufacture of pyrazole derivatives, in particular in processes for the manufacture of pharmaceutically or agrochemically active compounds.
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公开(公告)号:US20210040043A1
公开(公告)日:2021-02-11
申请号:US17078555
申请日:2020-10-23
Applicant: SOLVAY SA
Inventor: Suzanne WASSMANN , Janis JAUNZEMS , Stefan MROSS , Jean FABRE
IPC: C07D231/18 , C07D231/12 , C07C225/14
Abstract: The present invention concerns new halogen substituted diketone compounds, new pyrazole compounds, processes for the manufacture of pyrazole compounds and processes for the manufacture of agrochemical or pharmaceutical compounds.
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公开(公告)号:US20190135761A1
公开(公告)日:2019-05-09
申请号:US16099804
申请日:2017-05-09
Applicant: SOLVAY SA
Inventor: Janis JAUNZEMS
IPC: C07D231/14
Abstract: The present invention concerns compositions comprising (i) a 3-(haloalkyl or formyl)-1H-pyrazole wherein R1 is a halogenated C1-4 alkyl group, or the group —C(O)H, R2 is selected from the group consisting of H, C1-C12 alkyl, C2-C6 alkenyl, cycloalkyl, aryl, heteroaryl, aralkyl, each of which is optionally substituted, R3 is selected from the group consisting of H, C1-C12 alkyl, C2-C6 alkenyl, aryl or C3-C8 cycloalkyl, each of which is optionally substituted, and R4 is selected from the group consisting of H, X′, COOR′, OR′, SR′, C(O)NR′2, and (ii) at least one of the pyrazole derivatives of the formulae (II)-(X), (XVIIIa), (XVIIIb), (XIX) and (XX), wherein the chemical composition comprises equal to or more than 95 w % of compound of formula (I), its manufacture and use in processes for the manufacture of agrochemical or pharmaceutical pyrazole-4-carboxamide compounds.
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公开(公告)号:US20190031616A1
公开(公告)日:2019-01-31
申请号:US16071677
申请日:2017-01-27
Applicant: SOLVAY SA
Inventor: Suzanne WASSMANN , Janis JAUNZEMS , Stefan MROSS , Jean FABRE
IPC: C07D231/18 , C07C225/14
CPC classification number: C07D231/18 , C07C225/14 , C07D231/12
Abstract: The present invention concerns new halogen substituted diketone compounds, new pyrazole compounds, processes for the manufacture of pyrazole compounds and processes for the manufacture of agrochemical or pharmaceutical compounds.
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公开(公告)号:US20210171468A1
公开(公告)日:2021-06-10
申请号:US16771043
申请日:2018-12-20
Applicant: SOLVAY SA
Inventor: Janis JAUNZEMS , Alexander SCHULZ , Uta CLAASSEN
IPC: C07D231/14 , C07C221/00 , C07C249/16 , C07D231/12
Abstract: The present invention concerns processes for the manufacture of pyrazole carboxylic derivatives and precursors thereof.
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公开(公告)号:US20200305431A1
公开(公告)日:2020-10-01
申请号:US16771055
申请日:2018-12-20
Applicant: SOLVAY SA
Inventor: Janis JAUNZEMS , Alexander SCHULZ , Uta CLAASSEN , Andreas GROSSMANN
IPC: A01N43/56 , C07D231/14
Abstract: Disclosed are processes for the manufacture of pyrazole compounds of formula (I) and their application in the manufacture of pyrazole derivatives, in particular in processes for the manufacture of pharmaceutically or agrochemically active compounds, wherein in the processes, at least two steps are conducted in the presence of at least one solvent which is the same in the at least two steps, wherein the at least one same solvent is selected from the group consisting of aromatic hydrocarbons, alkanes, carboxylic acid esters, ethers, nitriles and dimethylformamide.
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公开(公告)号:US20190276409A1
公开(公告)日:2019-09-12
申请号:US16347960
申请日:2017-11-06
Applicant: SOLVAY SA
Inventor: Janis JAUNZEMS
IPC: C07D231/14
Abstract: This invention concerns a process for the manufacture of carboxylic acids or carboxylic acid derivatives and a process for the manufacture of agrochemically and pharmaceutically active compounds comprising the process for the manufacture of carboxylic acids or their derivatives. The process for the manufacture of carboxylic acids or carboxylic acid derivatives comprises the steps of: a) halogenating a compound of formula (I): R1—C(O)—CHX2, to obtain a compound of formula (II): R1—C(O)—CX2X′, b) transforming the compound of formula (II) in the presence of a compound A into a compound of formula (III): R′C(O)Z, wherein Z is a residue selected from the group consisting of —OH, —O−, —NR′R′. The process can optionally comprise additional steps.
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