公开(公告)号：US09840667B2

公开(公告)日：2017-12-12

申请号：US14786211

申请日：2014-04-16

Applicant: SOLVAY SA

Inventor： Jean-Marie Collard

IPC: C09K13/08 ,  B01D61/02 ,  H01L31/18 ,  C01B21/46 ,  C01B7/19 ,  H01M4/1395 ,  H01L31/0236 ,  H01M4/38

CPC classification number: C09K13/08 ,  B01D61/025 ,  C01B7/195 ,  C01B21/46 ,  H01L31/02363 ,  H01L31/1804 ,  H01M4/1395 ,  H01M4/386 ,  Y02E10/50

Abstract: Disclosed is a method of purifying a solution containing hydrofluoric acid, nitric acid and at least one silicon impurity by treating the solution with at least one reverse osmosis membrane. According to the method of the present invention, silicon impurities contained in the solution containing hydrofluoric acid and nitric acid can be selectively removed or reduced. This method can be advantageously used in the photovoltaic industry or in the battery component industry.