公开(公告)号：US20180171503A1

公开(公告)日：2018-06-21

申请号：US15887476

申请日：2018-02-02

Applicant: SPTS TECHNOLOGIES LIMITED

Inventor： John MACNEIL

IPC: C25D17/02 ,  C25D3/38 ,  C25D17/00 ,  C25F3/16 ,  C25F7/00

CPC classification number: C25D17/02 ,  C25D3/38 ,  C25D17/001 ,  C25D17/004 ,  C25D21/00 ,  C25F3/16 ,  C25F7/00

Abstract: According to the invention a method of removing electrolyte from an electrochemical deposition or polishing chamber comprising the steps of: providing an electrochemical deposition or polishing chamber comprising a support for a substrate, the support having an in-use position; a housing having an interior surface and a fluid outlet pathway for removing electrolyte from the chamber, wherein the fluid outlet pathway includes one or more slots which extend into the housing from at least one slotted opening formed in the interior surface; a seal for sealing the housing to a peripheral portion of a surface of a substrate position on the support in its in-use position; and a tilting mechanism for tilting the chamber in order to assist in removing electrolyte from the housing through the fluid outlet pathway; using an electrolyte to perform an electrochemical deposition or polishing processing on a substrate positioned on the support in its in-use position; and tilting the chamber using the tilting mechanism in order to assist in removing electrolyte from the housing through the fluid outlet pathway.