公开(公告)号：US10376859B2

公开(公告)日：2019-08-13

申请号：US15576214

申请日：2017-03-30

Applicant: STAMICARBON B.V.

Inventor： Juan Coloma González ,  Luc Louis Maria Dieltjens ,  Johannes Henricus Mennen

IPC: B01J19/00 ,  B01J19/18 ,  B01J19/24 ,  B01D3/06 ,  B01D3/14 ,  B01D5/00 ,  C07C273/04 ,  C07C275/02 ,  B01L3/06 ,  B01L3/14

Abstract: The invention is directed to a urea plant with a high pressure synthesis section and a recovery section. The high pressure synthesis section comprises a reactor, a stripper and a condenser, wherein the reactor operates at a higher pressure than the stripper and the condenser. The plant further includes a compression unit between the condenser and the reactor. The compression unit utilizes mechanical energy recovered from a decompression unit positioned downstream of the stripper and upstream of the recovery section.

公开(公告)号：US10730002B2

公开(公告)日：2020-08-04

申请号：US15495667

申请日：2017-04-24

Applicant: Stamicarbon B.V.

Inventor： Brian Sayre Higgins ,  John Marshall Tate, III ,  Robert Arthur Yates ,  Marcel Julien Pomerleau ,  Jon Michael Heon ,  Wilfried Marc Renaat Dirkx ,  Juan Coloma González

IPC: B01D47/05 ,  B01D47/06 ,  B01D47/10 ,  B01D47/12 ,  B01D53/40 ,  B01D53/58 ,  B01D53/79 ,  C07C273/16 ,  B01J2/04 ,  C05C9/00

Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).

公开(公告)号：US11331593B2

公开(公告)日：2022-05-17

申请号：US17423139

申请日：2020-06-05

Applicant: STAMICARBON B.V.

Inventor： Lambertus Wilhelmus Gevers ,  Juan Coloma González

IPC: B01D1/06 ,  B01D1/28 ,  B01D19/00 ,  C07C273/18 ,  C07C273/04

Abstract: A method is disclosed for stripping in a stripper a urea synthesis solution received from a urea forming process wherein ammonia and CO2 are reacted under urea forming conditions. The shell space of the stripper comprises a continuous vertical zone.

公开(公告)号：US20190224610A1

公开(公告)日：2019-07-25

申请号：US16300434

申请日：2017-05-09

Applicant: Stamicarbon B.V.

Inventor： Brian Sayre HIGGINS ,  John Marshall TATE, III ,  Robert Arthur YATES ,  Marcel Julien POMERLEAU ,  Jon Michael HEON ,  Wilfried Marc Renaat DIRKX ,  Juan Coloma González

IPC: B01D47/10 ,  B01D47/06 ,  B01D47/12 ,  B01D53/40 ,  B01D53/58 ,  B01D53/79 ,  B01J2/04

Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.

公开(公告)号：US10829444B2

公开(公告)日：2020-11-10

申请号：US16472792

申请日：2018-07-13

Applicant: STAMICARBON B.V.

Inventor： Juan Coloma González ,  Johannes Henricus Mennen

IPC: C07C273/16 ,  B01D53/58 ,  B01D53/73 ,  B01J2/04 ,  B01J4/00 ,  B01D47/10

Abstract: The invention pertains to a finishing process for urea-comprising material, a plant for finishing urea-comprising material, a method of modifying an existing plant, and a use. Methods are disclosed for preventing the clogging of the conduit for off-gas between the finishing section and the treatment section.

公开(公告)号：US10722831B2

公开(公告)日：2020-07-28

申请号：US16563696

申请日：2019-09-06

Applicant: Stamicarbon B.V.

Inventor： Brian Sayre Higgins ,  John Marshall Tate, III ,  Robert Arthur Yates ,  Marcel Julien Pomerleau ,  Jon Michael Heon ,  Wilfried Marc Renatt Dirkx ,  Juan Coloma González

IPC: B01D47/05 ,  B01D47/06 ,  B01D47/10 ,  B01D47/12 ,  B01D47/00 ,  B01D53/40 ,  B01D53/58 ,  B01D53/79 ,  B01J2/04 ,  C07C273/16 ,  C05C9/00

Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).