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公开(公告)号:US20240279802A1
公开(公告)日:2024-08-22
申请号:US18508704
申请日:2023-11-14
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jung-Min LEE , Gi Duck KWEON , Dae Ki KIM , Hang Kyu SONG , Hyun Tae YANG , Byoung Kwon YEO , Byeong Ho WOO , Jae Sung YU , Jung Bae CHOI
IPC: C23C16/44 , C23C16/455
CPC classification number: C23C16/4405 , C23C16/4408 , C23C16/4557
Abstract: Provided are a process chamber cleaning apparatus and method in which the inside of a process chamber may be cleaned without damaging to an inner wall or a component of the process chamber. The process chamber cleaning apparatus comprising: a chamber housing; a substrate support installed inside the chamber housing, supporting a plurality of semiconductor substrates; a gas supply providing process gases; a first gas injector installed inside the chamber housing, connected to the gas supply, injecting etch gas, which is one of the process gases, into the chamber housing; and a controller controlling operations of the gas supply and the first gas injector, wherein the first gas injector injects the etch gas in a direction twisted at a predetermined angle from a central direction of the chamber housing.
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公开(公告)号:US20250142805A1
公开(公告)日:2025-05-01
申请号:US18784296
申请日:2024-07-25
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jung Kun LIM , Young Chul LIM , Gi Duck KWEON , Hyo Joong KIM
IPC: H10B12/00
Abstract: A semiconductor memory device includes a semiconductor pattern on the substrate, and extending in a first horizontal direction, a bit-line and a first electrode of an information storage element electrically connected to two opposite ends of the semiconductor pattern, respectively, and a gate electrode on the semiconductor pattern, wherein the first electrode includes a first area and a second area spaced apart from each other in a vertical direction, and a connection area connecting the first area with the second area, wherein each of the first area and the second area includes first and second extensions spaced apart from each other in the vertical direction, and a connection portion connecting the first extension and the second extension and separated from the connection area, and wherein the connection area connects the second extension of the first area and the first extension of the second area adjacent to each other.
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