公开(公告)号：US06483068B2

公开(公告)日：2002-11-19

申请号：US09767260

申请日：2001-01-23

Applicant: Se-Jin Jang

Inventor： Se-Jin Jang

IPC: F27D1100

CPC classification number: H01L21/67115

Abstract: A hard baking apparatus which is capable of evenly heating a semiconductor substrate when a photoresist pattern of the semiconductor substrate is hard baked. The apparatus for hard baking a photoresist pattern including: a chamber; a chuck installed at a lower portion in the chamber on which a semiconductor substrate is mounted; a heating unit installed at an upper portion in the chamber; and a unit installed at a lower portion of the heating unit for evenly distributing light.