公开(公告)号：US20230367037A1

公开(公告)日：2023-11-16

申请号：US18316919

申请日：2023-05-12

Applicant: Shphotonics Ltd

Inventor： Lei SUN ,  Fei QIN ,  Xiangping LI

IPC: G02B1/00 ,  B82Y20/00 ,  G02B1/14

CPC classification number: G02B1/002 ,  B82Y20/00 ,  G02B1/14

Abstract: A metasurface optical element preparation method includes coating a nanomaterial over an end surface of a substrate, etching a part of the nanomaterial to the end surface of the substrate to obtain a discrete nano-pillar structure, filling a protection material in a gap of the discrete nano-pillar structure, and etching the protection material to cause a height of the protection material to be uniform and smaller than a height of the discrete nano-pillar structure.