公开(公告)号：US20220037457A1

公开(公告)日：2022-02-03

申请号：US16942078

申请日：2020-07-29

Applicant: Silicon Laboratories Inc.

Inventor： EDUARDO JOSE DOS SANTOS VIEGAS

IPC: H01L49/02 ,  H01F27/28 ,  H05K1/16 ,  G06F30/398 ,  H01F41/04

Abstract: In one aspect, an inductor may include at least one loop formed on a first metal layer and a non-uniform introduced pattern formed on the first metal layer and circumscribed by the at least one loop. The non-uniform introduced pattern may be formed of a plurality of structures and may have a maximum density at an interior portion thereof and a minimum density at a peripheral portion thereof, where at least some of the plurality of structures have different sizes.