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公开(公告)号:US20210405532A1
公开(公告)日:2021-12-30
申请号:US16919227
申请日:2020-07-02
Inventor: You Sin Tan , Joel Yang , Hailong Liu , Qifeng Ruan
Abstract: There is provided a method of forming a patterned structure on a substrate. The method includes: forming a resist layer on the substrate, the resist layer being a negative tone resist; exposing a first portion of the resist layer to a focused electron beam to form a modified first portion, the modified first portion defining a boundary of a second portion of the resist layer; performing a plasma treatment on a surface of the resist layer, including on a surface of the second portion of the resist layer to form a modified surface portion of the second portion of the resist layer, resulting in a plasma treated resist layer; and performing development of the plasma treated resist layer to form the patterned structure on the substrate corresponding the second portion of the resist layer.
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公开(公告)号:US11927785B2
公开(公告)日:2024-03-12
申请号:US17047074
申请日:2019-04-15
Inventor: Tze Peng Kevin Lim , Kwang Wei Joel Yang , Hailong Liu
IPC: G02B5/32 , G03H1/00 , G03H1/26 , B42D25/328
CPC classification number: G02B5/32 , G03H1/0011 , G03H1/26 , B42D25/328 , G03H2001/261 , G03H2223/15
Abstract: There is provided a holographic optical element including: a hologram portion including a plurality of groups of unit regions, each group of unit regions of the hologram portion being configured to produce a respective holographic image under a respective light illumination having a respective predetermined wavelength; and a colour filter portion formed on the hologram portion, the colour filter portion including a plurality of groups of unit regions, each group of unit regions of the colour filter portion being arranged on a corresponding group of the plurality of groups of unit regions of the hologram portion, whereby the plurality of groups of unit regions of the colour filter portion is spatially arranged to form a predetermined colour image. There is also provided a method of forming the holographic optical element. There is further provided an article having optical security incorporated therein.
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公开(公告)号:US11803125B2
公开(公告)日:2023-10-31
申请号:US16919227
申请日:2020-07-02
Inventor: You Sin Tan , Joel Yang , Hailong Liu , Qifeng Ruan
CPC classification number: G03F7/2037 , G03F7/038 , G03F7/0755 , G03F7/162 , G03F7/2022 , G03F7/322 , G03F7/38 , H01L21/0274
Abstract: There is provided a method of forming a patterned structure on a substrate. The method includes: forming a resist layer on the substrate, the resist layer being a negative tone resist; exposing a first portion of the resist layer to a focused electron beam to form a modified first portion, the modified first portion defining a boundary of a second portion of the resist layer; performing a plasma treatment on a surface of the resist layer, including on a surface of the second portion of the resist layer to form a modified surface portion of the second portion of the resist layer, resulting in a plasma treated resist layer; and performing development of the plasma treated resist layer to form the patterned structure on the substrate corresponding the second portion of the resist layer.
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