公开(公告)号：US11718905B2

公开(公告)日：2023-08-08

申请号：US16624233

申请日：2018-05-30

Applicant: TECHNETICS GROUP LLC

Inventor： Nader Kalkhoran ,  Eric Tobin ,  Tim Egge ,  Jason Burns ,  Rick Oliver ,  Angus McFadden ,  Jason Wright

IPC: C23C14/08 ,  C23C14/06 ,  C23C14/24 ,  C23C28/04 ,  C23C28/00 ,  H01J37/32 ,  C23C14/22

CPC classification number: C23C14/081 ,  C23C14/0694 ,  C23C14/083 ,  C23C14/221 ,  C23C14/24 ,  C23C28/042 ,  C23C28/42 ,  H01J37/32477 ,  H01J37/32715

Abstract: Techniques for depositing a functionally integrated coating structure on a substrate are provided. An example method according to the disclosure includes receiving the substrate into a process chamber of a multi-process ion beam assisted deposition system, disposing the substrate in a first zone including a first evaporator species and a first ion beam, wherein the first evaporator species is Aluminum Oxide (Al2O3), disposing the substrate in a second zone including a second evaporator species and a second ion beam, wherein the second evaporator species is Yttrium Oxide (Y2O3), and disposing the substrate in a third zone including a third evaporator species and a third ion beam, wherein the third evaporator species is Yttrium Fluoride (YF3).