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公开(公告)号:US20230190571A1
公开(公告)日:2023-06-22
申请号:US18065623
申请日:2022-12-14
Applicant: TECHNO TAKATSUKI CO., LTD.
Inventor: Hideki ISHII , Kazuma SHIMIZU
IPC: A61H9/00
CPC classification number: A61H9/0078 , A61H2201/1238 , A61H2201/5056 , A61H2201/0107 , A61H2201/1409
Abstract: An air pump system includes a pump, a main valve device, and a distribution valve device connected between the pump and the main valve device, that includes a first portion forming a first chamber and a second portion forming a second chamber. The first portion includes a first free port to fluidly couple the first chamber with the pump, a first connection port to fluidly couple the first chamber with the main valve device, a second connection port to fluidly couple the first chamber with an outside of the distribution valve device, and a first valve switch. The second portion includes a second free port to fluidly couple the second chamber with the pump, a third connection port to fluidly couple the second chamber with the main valve device, a fourth connection port to fluidly couple the second chamber with the outside, and a second valve switch.
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公开(公告)号:US20230172790A1
公开(公告)日:2023-06-08
申请号:US18060798
申请日:2022-12-01
Applicant: TECHNO TAKATSUKI CO., LTD.
Inventor: Kazuma SHIMIZU
IPC: A61H9/00
CPC classification number: A61H9/0092
Abstract: A gas-type massage device is a gas-type massage device to be fitted to at least one part of upper limbs or lower limbs of the human body along an axial direction in which the one part extends so as to surround the one part in a peripheral direction to administer a massage to the human body using a high-pressure gas, wherein the gas-type massage device has a plurality of gas chambers, each of which plurality of gas chambers expands and contracts mutually independently so as to receive a high-pressure gas to expand and discharge a high-pressure gas to contract, the plurality of gas chambers comprise first and second gas chamber groups to be provided so as to be mutually adjacent in the axial direction, and each of the first and second gas chamber group has at least two gas chambers along a peripheral direction.
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