PLANAR COIL STELLARATOR
    1.
    发明公开

    公开(公告)号:US20240153651A1

    公开(公告)日:2024-05-09

    申请号:US18415840

    申请日:2024-01-18

    Inventor: David Gates

    CPC classification number: G21B1/055 H01F6/06

    Abstract: Disclosed herein is a stellarator comprising two sets of coils, namely a set of encircling coils which encircle the plasma axis, and a set of shaping coils which do not encircle any other coil or the plasma. In some embodiments, the encircling coils include a structural element to maintain their shape under magnetic forces. In some embodiments, the shaping coils are mounted onto one or more structural elements which, together with the shaping coils, constitute a field shaping unit. Also disclosed is a controller which may modify the electrical current flowing in one or more subsets of the coils in order to achieve target plasma parameters. Also disclosed is a method of designing a set of shaping coils by discretizing a surface dipole or current potential distribution.

    Planar coil stellarator
    2.
    发明授权

    公开(公告)号:US12009111B2

    公开(公告)日:2024-06-11

    申请号:US18119981

    申请日:2023-03-10

    Inventor: David Gates

    CPC classification number: G21B1/055 H01F6/06

    Abstract: Disclosed herein is a stellarator comprising two sets of coils, namely a set of encircling coils which encircle the plasma axis, and a set of shaping coils which do not encircle any other coil or the plasma. In some embodiments, the encircling coils include a structural element to maintain their shape under magnetic forces. In some embodiments, the shaping coils are mounted onto one or more structural elements which, together with the shaping coils, constitute a field shaping unit. Also disclosed is a controller which may modify the electrical current flowing in one or more subsets of the coils in order to achieve target plasma parameters. Also disclosed is a method of designing a set of shaping coils by discretizing a surface dipole or current potential distribution.

    PLANAR COIL STELLARATOR
    3.
    发明申请

    公开(公告)号:US20250087376A1

    公开(公告)日:2025-03-13

    申请号:US18957228

    申请日:2024-11-22

    Inventor: David Gates

    Abstract: Disclosed herein is a stellarator comprising two sets of coils, namely a set of encircling coils which encircle the plasma axis, and a set of shaping coils which do not encircle any other coil or the plasma. In some embodiments, the encircling coils include a structural element to maintain their shape under magnetic forces. In some embodiments, the shaping coils are mounted onto one or more structural elements which, together with the shaping coils, constitute a field shaping unit. Also disclosed is a controller which may modify the electrical current flowing in one or more subsets of the coils in order to achieve target plasma parameters. Also disclosed is a method of designing a set of shaping coils by discretizing a surface dipole or current potential distribution.

    Planar coil stellarator
    4.
    发明授权

    公开(公告)号:US12100520B2

    公开(公告)日:2024-09-24

    申请号:US18415840

    申请日:2024-01-18

    Inventor: David Gates

    CPC classification number: G21B1/055 H01F6/06

    Abstract: Disclosed herein is a stellarator comprising two sets of coils, namely a set of encircling coils which encircle the plasma axis, and a set of shaping coils which do not encircle any other coil or the plasma. In some embodiments, the encircling coils include a structural element to maintain their shape under magnetic forces. In some embodiments, the shaping coils are mounted onto one or more structural elements which, together with the shaping coils, constitute a field shaping unit. Also disclosed is a controller which may modify the electrical current flowing in one or more subsets of the coils in order to achieve target plasma parameters. Also disclosed is a method of designing a set of shaping coils by discretizing a surface dipole or current potential distribution.

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