公开(公告)号：US20240207884A1

公开(公告)日：2024-06-27

申请号：US18514787

申请日：2023-11-20

Applicant: THE UNIVERSITY OF SHEFFIELD

Inventor： Chris SCRAGGS ,  George SLEATH

IPC: B05C5/02 ,  B05D1/26 ,  B05D1/40

CPC classification number: B05C5/0254 ,  B05D1/26 ,  B05D1/40

Abstract: An applicator for the deposition of sealant onto a surface of a workpiece is disclosed having at least one inlet for depositing sealant on to a surface or a nozzle-receiving space for receiving a nozzle comprising at least one inlet for depositing sealant on to a surface; at least one sealant-contacting surface for contacting sealant deposited onto the surface through the inlet as the applicator is moved across the surface, thereby forming a film of sealant on said surface; at least one spacer for contacting a surface onto which sealant is to be deposited and for maintaining the sealant-contacting surface in spaced relationship with the surface; and at least one inlet reservoir for receiving sealant from at least one inlet, the inlet reservoir being configured to provide a covered space when the applicator is in contact with a surface onto which sealant is to be deposited.

公开(公告)号：US20240207887A1

公开(公告)日：2024-06-27

申请号：US18514712

申请日：2023-11-20

Applicant: THE UNIVERSITY OF SHEFFIELD

Inventor： Chris SCRAGGS ,  George SLEATH ,  Phil KITCHEN

IPC: B05C5/02 ,  B05C11/10

CPC classification number: B05C5/0295 ,  B05C5/0262 ,  B05C11/1005

Abstract: An applicator for the deposition of sealant onto a surface of a workpiece is disclosed including at least one inlet for depositing sealant on to a surface or a nozzle-receiving space for receiving a nozzle comprising at least one inlet for depositing sealant on to a surface; at least one sealant-contacting surface for contacting sealant deposited onto the surface through the inlet as the applicator is moved across said surface, thereby forming a film of sealant on the surface; at least one spacer for contacting a surface onto which sealant is to be deposited and for maintaining the sealant-contacting surface in spaced relationship with the surface; the applicator being configured to facilitate the formation of films of different widths.