公开(公告)号：US10571619B2

公开(公告)日：2020-02-25

申请号：US15109337

申请日：2015-07-16

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Tsukasa Kitahara ,  Osamu Tokinoya ,  Takeshi Nishikawa

IPC: F21V8/00 ,  B32B27/36 ,  B32B9/04 ,  B32B3/00 ,  B32B27/06 ,  F21V9/00 ,  G02B1/10 ,  F21V9/30 ,  G02B1/14 ,  F21V9/32 ,  G02B6/00 ,  C09K11/00 ,  B82Y20/00 ,  G02F1/1335 ,  G02F1/13357 ,  G02F1/1333 ,  B32B7/12 ,  B32B27/08 ,  H01L33/50

Abstract: A first quantum dot protective film comprises a first barrier film including a silica deposition layer, and a first diffusion layer. An O/Si ratio of the silica deposition layer is 1.7 or more and 2.0 or less on an atomic ratio basis, and a refractive index of the silica deposition layer is 1.5 or more and 1.7 or less; and a reflectance of the first quantum dot protective film is 10% or more and 20% or less at each of wavelengths of 450 nm, 540 nm and 620 nm, and a transmittance of the first quantum dot protective film is 80% or more and 87% or less at each of wavelengths of 450 nm, 540 nm and 620 nm.