公开(公告)号：US20240242978A1

公开(公告)日：2024-07-18

申请号：US18413295

申请日：2024-01-16

Applicant: Tokyo Electron Limited

Inventor： Shota UMEZAKI ,  Shigeru MORIYAMA ,  Tomotaka OMAGARI ,  Keiichi YAHATA ,  Shuji OIE ,  Yuichi TANAKA ,  Katsuhiro OOKAWA ,  Manabu YAMANAKA ,  Takuya ITAHASHI

IPC: H01L21/67 ,  F26B5/04

CPC classification number: H01L21/67034 ,  F26B5/04 ,  H01L21/67126 ,  H01L21/67242

Abstract: A substrate processing apparatus includes a drying unit for replacing a liquid film formed on a substrate with a supercritical fluid to dry the substrate, and a control device. The drying unit includes a pressure container, a supply mechanism for supplying fluid to the pressure container, a discharge mechanism for discharging the fluid from the pressure container, a panel for separating an internal space from an external space, an electromagnetic lock, and a concentration sensor for detecting a concentration of the fluid. An unlocking condition for the control device to switch a state of the electromagnetic lock from a locked state to an unlocked state includes a condition that a detection value of the pressure sensor is less than or equal to a first threshold value and a condition that a detection value of the concentration sensor is less than or equal to a second threshold value.

公开(公告)号：US20230234091A1

公开(公告)日：2023-07-27

申请号：US18129150

申请日：2023-03-31

Applicant: Tokyo Electron Limited

Inventor： Chikara NOBUKUNI ,  Tomoaki OJIMA ,  Takuya ITAHASHI ,  Ryoichi HORIGUCHI ,  Shota WAKAYAMA

IPC: B05C3/02 ,  B05C11/10

CPC classification number: B05C3/02 ,  B05C11/1026 ,  B05C11/1015 ,  B05C11/1039 ,  B05C11/1042 ,  H01L21/67023

Abstract: A liquid processing apparatus includes: a tank configured to store a processing liquid supplied from a processing liquid supply source; a circulation passage connected to the tank; a pump installed at the circulation passage; a plurality of liquid processors configured to perform liquid processing on a substrate; and a plurality of supply passages configured to supply the processing liquid to the plurality of liquid processors respectively, wherein the circulation passage includes a main passage portion provided with the pump, and a first branch passage portion and a second branch passage portion branching from the main passage portion, and the processing liquid flowing out from the tank passes through the main passage portion, then flows into the first branch passage portion and the second branch passage portion, and then returns to the tank through the first branch passage portion and the second branch passage portion.

公开(公告)号：US20210001370A1

公开(公告)日：2021-01-07

申请号：US16918678

申请日：2020-07-01

Applicant: Tokyo Electron Limited

Inventor： Chikara NOBUKUNI ,  Tomoaki OJIMA ,  Takuya ITAHASHI ,  Ryoichi HORIGUCHI ,  Shota WAKAYAMA

IPC: B05C3/02 ,  B05C11/10

Abstract: A liquid processing apparatus includes: a tank configured to store a processing liquid supplied from a processing liquid supply source; a circulation passage connected to the tank; a pump installed at the circulation passage; a plurality of liquid processors configured to perform liquid processing on a substrate; and a plurality of supply passages configured to supply the processing liquid to the plurality of liquid processors respectively, wherein the circulation passage includes a main passage portion provided with the pump, and a first branch passage portion and a second branch passage portion branching from the main passage portion, and the processing liquid flowing out from the tank passes through the main passage portion, then flows into the first branch passage portion and the second branch passage portion, and then returns to the tank through the first branch passage portion and the second branch passage portion.