公开(公告)号：US20190184413A1

公开(公告)日：2019-06-20

申请号：US15846257

申请日：2017-12-19

Applicant: U.S. Army Research Laboratory ATTN: RDRL-LOC-1

Inventor： David Baker ,  Joshua P. McClure ,  Kyle N. Grew

IPC: B05B5/08 ,  C23C16/48 ,  H01L27/144 ,  G01N21/65 ,  B05D1/38

Abstract: Plasmonically enhanced electric fields are used to deposit particles at selected locations through decomposition or electron transfer reactions with precursor molecules in gas or liquid phase. The location of the enhanced electric fields is controlled through a combination of plasmonic substrate structure shape, material, incident light wavelength and polarization. The particles are deposited at designated locations only, whereby no deposition occurs at locations lacking enhanced electric fields. Many reaction variables can be used to change the rate of particle deposition such as precursor molecules, exposure time, precursor concentration, and temperature making for a highly customizable reaction space.