公开(公告)号：US20200248301A1

公开(公告)日：2020-08-06

申请号：US16853141

申请日：2020-04-20

Applicant: ULVAC, INC.

Inventor： Ken MAEHIRA ,  Koh FUWA ,  Tomoko KITTAKA ,  Tetsuhiro OHNO ,  Hirotoshi SAKAUE

IPC: C23C14/50 ,  C23C14/34 ,  H02N13/00

Abstract: A first voltage is applied to a first positive electrode and a first negative electrode of an attraction plate in a lying posture to attract a dielectric object to be attracted on the attraction plate. The attraction plate is turned to a stand posture while attracting the dielectric object by a gradient force, and a conductive thin film is grown while applying a second voltage to a second positive electrode and a second negative electrode to generate an electrostatic force. Since the object is continuously attracted, the attraction plate will not detach. After having started attraction by electrostatic force, introduction of heat medium gas between the object and the attraction plate allows for temperature control of the object.