公开(公告)号：US20210140032A1

公开(公告)日：2021-05-13

申请号：US17052056

申请日：2019-03-28

Applicant: ULVAC, INC.

Inventor： Ryouta NAKAMURA ,  Tomohiro NAGATA ,  Yasuhiko AKAMATSU ,  Motoshi KOBAYASHI ,  Yuusuke UJIHARA ,  Yasuo NAKADAI ,  Junichi NITTA

IPC: C23C14/34 ,  C22C21/08

Abstract: [Object] It is an object of the present invention to provide an aluminum alloy target capable of forming an aluminum alloy film having excellent bending resistance and heat resistance, and a method of producing the aluminum alloy target.
[Solving Means] In order to achieve the above-mentioned object, an aluminum alloy target according to an embodiment of the present invention includes: an Al pure metal that includes at least one type of a first additive element selected from the group consisting of Zr, Sc, Mo, Y, Nb, and Ti. A content of the first additive element is 0.01 atomic % or more and 1.0 atomic % or less. The aluminum alloy film formed using such an aluminum alloy target has excellent bending resistance and excellent heat resistance. Further, also etching can be performed on the aluminum alloy film.

公开(公告)号：US20210226028A1

公开(公告)日：2021-07-22

申请号：US17055852

申请日：2019-03-28

Applicant: ULVAC, INC.

Inventor： Yuusuke UJIHARA ,  Motoshi KOBAYASHI ,  Yasuhiko AKAMATSU ,  Tomohiro NAGATA ,  Ryouta NAKAMURA ,  Junichi NITTA ,  Yasuo NAKADAI

IPC: H01L29/49 ,  H01L21/285 ,  C22C21/00 ,  C23C14/14 ,  C22F1/04

Abstract: [Object] It is an object of the present invention to provide an aluminum alloy film having excellent bending resistance and heat resistance, and a thin film transistor including the aluminum alloy film.
[Solving Means] In order to achieve the above-mentioned object, an aluminum alloy film according to an embodiment of the present invention includes: an Al pure metal that includes at least one type of a first additive element selected from the group consisting of Zr, Sc, Mo, Y, Nb, and Ti. A content of the first additive element is 0.01 atomic % or more and 1.0 atomic % or less. Such an aluminum alloy film has excellent bending resistance and excellent heat resistance. Further, also etching can be performed on the aluminum alloy film.