公开(公告)号：US20190137265A1

公开(公告)日：2019-05-09

申请号：US16092751

申请日：2017-04-05

Applicant: UNITY SEMICONDUCTOR

Inventor： Jean-François BOULANGER ,  Benoît THOUY

IPC: G01B11/24 ,  G01B9/02 ,  G01B11/06 ,  H01L21/66

Abstract: A method for the inspection and measurement of a face of an object having at least two surfaces staggered depthwise with respect to one another, the surfaces forming in particular a step or a trench on/in the face, the method including the following steps: measuring an interferometric signal, called measured signal, at several points, called measurement points, of the inspected face; for at least one measurement point, extracting the measured signal relative to at least one, in particular to each, surface, the extraction providing for the measurement point an interferometric signal, called individual signal, for the surface; profilometric analysis of the individual signals, independently for each surface. Also included is a system for the inspection and measurement of a face of an object implementing such a method.

公开(公告)号：US20180364028A1

公开(公告)日：2018-12-20

申请号：US16061268

申请日：2016-12-07

Applicant: UNITY SEMICONDUCTOR

Inventor： Jean-Philippe PIEL ,  Jeff WuYu SU ,  Benoît THOUY

IPC: G01B11/06 ,  G01B9/02

Abstract: A device for measuring heights and/or thicknesses on a measurement object, includes (i) a first low-coherence interferometer for combining, in one spectrometer, a reference optical beam and a measurement optical beam originating from reflections of the light on interfaces of the measurement object, to produce a grooved spectrum signal with spectral modulation frequencies, (ii) apparatus for measuring an item of position information representative of the relative optical length, (iii) electronic and calculating apparatus arranged for determining at least one spectral modulation frequency representative of an optical path difference between the measurement optical beam and the reference optical beam, and for determining, by exploiting the item of information and the spectral modulation frequency, at least one height and/or thickness on the measurement object, and (iv) second optical apparatus for measuring distance and/or thickness with a second measurement beam incident on the measurement object on a second face opposite the measurement beam.