ELECTROPLATING APPARATUS AND ELECTROPLATING METHOD

    公开(公告)号:US20230124732A1

    公开(公告)日:2023-04-20

    申请号:US17745809

    申请日:2022-05-16

    Abstract: An electroplating apparatus including an anode and a cathode, a power supply, and a regulating plate is provided. The power supply is electrically connected to the anode and the cathode. The regulating plate is arranged between the anode and the cathode. The regulating plate includes an insulating grid plate and a plurality of magnetic components. The plurality of magnetic components are uniformly and randomly arranged on the insulating grid plate. An electroplating method is also provided.

    ELECTROPLATING APPARATUS AND ELECTROPLATING METHOD

    公开(公告)号:US20230120741A1

    公开(公告)日:2023-04-20

    申请号:US17700531

    申请日:2022-03-22

    Abstract: Provided is an electroplating apparatus including an electroplating tank, an anode and a cathode, a power supply, and a regulating plate. The electroplating tank accommodates electrolyte. Both the anode and the cathode are disposed in the electroplating tank. The power supply is electrically connected to the anode and the cathode. The regulating plate is disposed between the anode and the cathode. The regulating plate includes a plurality of mesh openings and a plurality of metal sheets, and at least part of the metal sheets is electrically connected with the cathode. An electroplating method is also provided.

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