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公开(公告)号:US20230235444A1
公开(公告)日:2023-07-27
申请号:US18184423
申请日:2023-03-15
Inventor: ANDREW STOLLENWERK , TIMOTHY KIDD
CPC classification number: C23C14/185 , C23C14/30 , C23C14/34 , C23C14/5806 , C23C14/0005
Abstract: The present disclosure relates generally to thin metal films having an ultra-flat surface and methods of their preparation. In particular, the ultra-flat thin metal films comprise FCC metals. Preferably, the thin metal films are attached to a substrate. Preferred substrates comprise chalcogenides and dichalcogenides. Beneficially, the thin metal films described herein can be prepared at ambient temperatures.