公开(公告)号：US20070261559A1

公开(公告)日：2007-11-15

申请号：US11430614

申请日：2006-05-09

Applicant: Peter Maroulis ,  Suhas Ketkar ,  Wayne McDermott

Inventor： Peter Maroulis ,  Suhas Ketkar ,  Wayne McDermott

IPC: B01D46/00

CPC classification number: C23C16/4402 ,  G01N1/2205 ,  G01N2001/105

Abstract: An improved process for supplying to a processing apparatus a gas containing at least one impurity that reacts and/or nucleates to form contaminating particles suspended in the gas is disclosed. The improvement includes sampling a flow of the gas upstream of the processing apparatus with a particle counter and/or particle capture filter to detect an amount of the contaminating particles in the flow of the gas, and generating a signal when the amount of particles is in excess of a predetermined amount. An apparatus for performing the process includes: a supply source; at least one processing tool; a particle counter upstream of the processing tool and downstream of the supply source; a microprocessor in electrical communication with at least the particle counter; and optionally a particle capture filter in parallel with the particle counter. The process and apparatus are useful in the manufacture of integrated circuits.

Abstract translation: 公开了一种用于向处理装置供应包含至少一种使得在气体中悬浮的污染颗粒反应和/或成核以形成杂质的气体的改进方法。 该改进包括用颗粒计数器和/或颗粒捕获过滤器在处理装置上游对气体进行采样，以检测气体流中的污染颗粒的量，并且当颗粒的量处于 超过预定量。 一种用于执行该处理的装置，包括：供应源; 至少一个处理工具; 处理工具上游的粒子计数器，并在供给源的下游; 至少与微粒计数器电通信的微处理器; 以及任选地与颗粒计数器平行的颗粒捕获过滤器。 该方法和装置在集成电路的制造中是有用的。

公开(公告)号：US20070137675A1

公开(公告)日：2007-06-21

申请号：US11702317

申请日：2007-02-05

Applicant: Wayne McDermott ,  Gene Parris ,  Dean Roth ,  Hoshang Subawalla

Inventor： Wayne McDermott ,  Gene Parris ,  Dean Roth ,  Hoshang Subawalla

IPC: B08B3/00 ,  B08B3/12 ,  B08B7/00

CPC classification number: B08B7/0021 ,  B08B1/00 ,  B08B3/02 ,  B08B3/12 ,  Y10S134/902

Abstract: Method for removing flux residue and defluxing residue from an article using a dense processing fluid and a dense rinse fluid is disclosed herein. In one embodiment, there is provided a method comprising: introducing the article comprising contaminants into a processing chamber; contacting the article with a dense processing fluid comprising a dense fluid, at least one processing agent, and optionally a cosolvent to provide a partially treated article; and contacting the partially treated article with a dense rinse fluid comprising the dense fluid and optionally the cosolvent to provide a treated article wherein an agitation source is introducing during at least a portion of the first and/or the second contacting step.

公开(公告)号：US20080004194A1

公开(公告)日：2008-01-03

申请号：US11834800

申请日：2007-08-07

Applicant: Wayne McDermott ,  Hoshang Subawalla ,  Andrew Johnson ,  Alexander Schwarz ,  Richard Ockovic

Inventor： Wayne McDermott ,  Hoshang Subawalla ,  Andrew Johnson ,  Alexander Schwarz ,  Richard Ockovic

IPC: C11D7/00

CPC classification number: H01L21/6704 ,  H01L21/02101 ,  H01L21/31133

Abstract: Methods for generating a single-phase supercritical dense processing fluid have been disclosed. The single-phase supercritical dense processing fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. At least one processing agent is added to the pressurization vessel, or to the processing chamber, or to the single-phase supercritical dense fluid during transfer from the pressurization vessel to the processing chamber; to produce the single-phase supercritical dense processing fluid. Methods for processing an article with a single-phase supercritical dense processing fluid in a processing chamber are also disclosed.

Abstract translation: 已经公开了生产单相超临界致密加工流体的方法。 单相超临界致密加工流体可以在单独的加压容器中产生并转移到处理室，或者可以直接在处理室中产生。 在从加压容器到处理室的转移期间，至少一种加工剂被加入到加压容器或处理室中，或加到单相超临界稠密流体中; 生产单相超临界浓缩加工液。 还公开了在处理室中用单相超临界致密加工流体处理制品的方法。

公开(公告)号：US20070240740A1

公开(公告)日：2007-10-18

申请号：US11403749

申请日：2006-04-13

Applicant: Wayne McDermott

Inventor： Wayne McDermott

IPC: B08B3/12

CPC classification number: B01J3/008 ,  B01J19/18 ,  B08B7/0021 ,  G03F1/82 ,  G03F7/423 ,  H01L21/02101 ,  H01L21/31133 ,  H01L21/67023 ,  Y02P20/544

Abstract: Method for removing contaminant material from a contaminated article comprising contacting the contaminated article with a reactive cleaning fluid comprising water and an oxidant material at a temperature at or above the critical temperature of the reactive cleaning fluid and a pressure at or above the critical pressure of the reactive cleaning fluid, oxidizing at least a portion of the contaminant material to yield a cleaned article and a product mixture comprising unreacted reactive cleaning fluid and removed contaminant material, and separating the product mixture from the cleaned article.

Abstract translation: 从被污染物品中去除污染物质的方法，包括使污染物品与包含水和氧化剂物质的反应性清洁流体在等于或高于反应性清洁流体的临界温度的温度下接触， 氧化至少一部分污染物质以产生清洁的制品，以及包含未反应的反应性清洁流体和去除的污染物质的产品混合物，以及将产品混合物与经清洁的物品分离。

公开(公告)号：US20070227357A1

公开(公告)日：2007-10-04

申请号：US11395409

申请日：2006-03-31

Applicant: Wayne McDermott

Inventor： Wayne McDermott

IPC: B01D45/12

CPC classification number: F04D19/042 ,  B01D53/24

Abstract: System for separating a gas mixture comprising a plurality of separation stages, each having a reference number n from 1 to N, inclusive. Each stage has a housing, a turbomolecular pump assembly therein having inlet and outlet ends, a first chamber adjacent the inlet end and having an inlet port and a first outlet port, and a second chamber adjacent the outlet end and having a second outlet port. The inlet port of a separation stage n is connected with the first outlet port of an adjacent stage n+1, and the second outlet port of the stage n is connected with the inlet port of the stage n+1. The inlet port of any stage may serve as a feed port. The first chamber of stage n=1 and the second chamber of stage n=N have first and second product outlets, respectively.

Abstract translation: 用于分离包含多个分离级的气体混合物的系统，每个分离级具有从1到N的参考数n，包括端值。 每个阶段具有壳体，其中具有入口端和出口端的涡轮分子泵组件，与入口端相邻的第一腔室，具有入口端口和第一出口端口，以及邻近出口端并具有第二出口的第二腔室。 分离级n的入口与相邻级n + 1的第一出口连接，级n的第二出口与级n + 1的入口连接。 任何级的入口可以用作进料口。 阶段n = 1的第一室和阶段n = N的第二室分别具有第一和第二产品出口。

公开(公告)号：US20060081273A1

公开(公告)日：2006-04-20

申请号：US10969595

申请日：2004-10-20

Applicant: Wayne McDermott ,  Hoshang Subawalla ,  Madhukar Rao ,  Dean Roth ,  Keith Fabregas

Inventor： Wayne McDermott ,  Hoshang Subawalla ,  Madhukar Rao ,  Dean Roth ,  Keith Fabregas

IPC: B08B3/00

CPC classification number: B08B7/0021 ,  G03F7/422 ,  H01L21/02057 ,  H01L21/02063 ,  H01L21/02101 ,  H05K3/26

Abstract: A method for removing contaminants from an article is described herein. In one embodiment, there is provided a method comprising loosening at least a portion of the contaminants by treating the article with a treatment method involving a processing fluid and/or dense processing fluid to provide a partially treated article comprising loosened contaminants; contacting the partially treated article with a dense rinse fluid comprising a dense fluid, optionally a co-solvent, and optionally an entrainer to remove liquid-based contaminants; and removing at least a portion of the loosened contaminants by exposing the partially treated article with at least one exposure method to provide a treated article wherein the selection of the at least one exposure method depends upon whether the loosened contaminants are wet or dry.

Abstract translation: 本文描述了从制品中除去污染物的方法。 在一个实施方案中，提供了一种方法，包括通过用涉及加工流体和/或致密加工流体的处理方法处理制品来松散至少一部分污染物，以提供包含松散的污染物的部分处理的制品; 使部分处理的制品与致密的流体，任选的助溶剂和任选的夹带剂一起使用，以除去液体基的污染物; 以及通过用至少一种曝光方法暴露所述部分处理的制品来除去所述松散的污染物的至少一部分，以提供经处理的制品，其中所述至少一种曝光方法的选择取决于松散的污染物是湿的还是干的。

公开(公告)号：US20050183739A1

公开(公告)日：2005-08-25

申请号：US10785298

申请日：2004-02-24

Applicant: Wayne McDermott ,  Dean Roth ,  Richard Ockovic

Inventor： Wayne McDermott ,  Dean Roth ,  Richard Ockovic

IPC: B08B3/08 ,  B06B1/02 ,  B06B1/06 ,  B06B3/00 ,  B08B3/12 ,  H01L21/304

CPC classification number: B06B3/00 ,  B08B3/12

Abstract: Ultrasonic probe comprising an elongate body having a first end and a second end, an ultrasonic transducer attached to the probe at or adjacent the first end, and an enlarged support section intermediate the ultrasonic transducer and the second end, wherein the enlarged support section has an equivalent diameter greater than an equivalent diameter of the body at any location between the enlarged support section and the ultrasonic transducer. The probe may be used to introduce ultrasonic energy into ultrasonic cleaning systems.

Abstract translation: 超声波探头包括具有第一端和第二端的细长主体，在第一端处或邻近第一端附接到探针的超声波换能器，以及位于超声波换能器和第二端之间的扩大的支撑部分，其中扩大的支撑部分具有 等效直径大于在扩大的支撑部分和超声波换能器之间的任何位置处的本体的等效直径。 探头可用于将超声波能量引入超声波清洗系统。

公开(公告)号：US20060172428A1

公开(公告)日：2006-08-03

申请号：US11340641

申请日：2006-01-27

Applicant: Wayne McDermott ,  Richard Ockovic ,  Dean Roth

Inventor： Wayne McDermott ,  Richard Ockovic ,  Dean Roth

IPC: G01N33/48

CPC classification number: G01N1/2205 ,  G01N1/34 ,  G01N15/00 ,  G01N15/0205 ,  G01N15/0606 ,  Y10T436/25 ,  Y10T436/25125 ,  Y10T436/25375 ,  Y10T436/255 ,  Y10T436/25875

Abstract: A system and method comprising same for measuring and analyzing particles within a gas feed stream. In one aspect, the system comprises a particle counter and a particle capture filter that are arranged in parallel. In another aspect, the system comprises a purifying device to remove trace molecular impurities from a gas feed stream to reduce the presence of impurities.

Abstract translation: 一种用于测量和分析气体进料流中的颗粒的系统和方法。 一方面，该系统包括平行布置的颗粒计数器和颗粒捕获过滤器。 另一方面，该系统包括净化装置以从气体进料流中除去痕量分子杂质以减少杂质的存在。

公开(公告)号：US20060164784A1

公开(公告)日：2006-07-27

申请号：US11389772

申请日：2006-03-27

Applicant: Chun Dong ,  Wayne McDermott ,  Richard Patrick ,  Alexander Schwarz

Inventor： Chun Dong ,  Wayne McDermott ,  Richard Patrick ,  Alexander Schwarz

IPC: H01T23/00

CPC classification number: C23G5/00 ,  B08B7/00 ,  B23K1/0016 ,  B23K1/008 ,  B23K1/012 ,  B23K1/206 ,  H05K3/3489 ,  H05K2203/095

Abstract: The present invention provides a method and apparatus for the dry fluxing of at least one component and/or solder surface via electron attachment. In one embodiment, there is provided a method for removing oxides from the surface of a component comprising: providing a component on a substrate wherein the substrate is grounded or has a positive electrical potential to form a target assembly; passing a gas mixture comprising a reducing gas through an ion generator comprising a first and a second electrode; supplying an amount of voltage to at least one of the first and second electrodes sufficient to generate electrons wherein the electrons attach to at least a portion of the reducing gas and form a negatively charged reducing gas; and contacting the target assembly with the negatively charged reducing gas to reduce the oxides on the component.

Abstract translation: 本发明提供了一种用于通过电子附件干燥熔化至少一种组分和/或焊料表面的方法和装置。 在一个实施方案中，提供了从组分表面去除氧化物的方法，包括：在基底上提供组分，其中所述基底接地或具有正电位以形成靶组件; 使包含还原气体的气体混合物通过包括第一和第二电极的离子发生器; 向所述第一和第二电极中的至少一个电极供应足以产生电子的电压，其中所述电子附着到所述还原气体的至少一部分并形成带负电荷的还原气体; 并将目标组件与带负电荷的还原气体接触以减少部件上的氧化物。

公开(公告)号：US20060011217A1

公开(公告)日：2006-01-19

申请号：US10890502

申请日：2004-07-13

Applicant: Wayne McDermott ,  Gene Parris ,  Dean Roth ,  Hoshang Subawalla

Inventor： Wayne McDermott ,  Gene Parris ,  Dean Roth ,  Hoshang Subawalla

IPC: B08B3/12

CPC classification number: B08B7/0021 ,  B08B1/00 ,  B08B3/02 ,  B08B3/12 ,  Y10S134/902

Abstract: Method for removing flux residue and defluxing residue from an article using a dense processing fluid and a dense rinse fluid is disclosed herein. In one embodiment, there is provided a method comprising: introducing the article comprising contaminants into a processing chamber; contacting the article with a dense processing fluid comprising a dense fluid, at least one processing agent, and optionally a cosolvent to provide a partially treated article; and contacting the partially treated article with a dense rinse fluid comprising the dense fluid and optionally the cosolvent to provide a treated article wherein an agitation source is introducing during at least a portion of the first and/or the second contacting step.

Abstract translation: 本文公开了使用致密加工流体和致密冲洗流体从制品中除去助熔剂残余物和脱硫残渣的方法。 在一个实施方案中，提供了一种方法，包括：将包含污染物的制品引入处理室; 使所述制品与包含致密流体，至少一种加工剂和任选的共溶剂的致密加工流体接触以提供部分处理的制品; 以及使所述部分处理的制品与包含所述致密流体和任选的共溶剂的致密冲洗流体接触以提供经处理的制品，其中在所述第一和/或所述第二接触步骤的至少一部分期间引入搅拌源。