Forming optical components using selective area epitaxy

    公开(公告)号:US12282189B2

    公开(公告)日:2025-04-22

    申请号:US18636784

    申请日:2024-04-16

    Inventor: Thomas Wunderer

    Abstract: A mask material is deposited on a substrate or growth template. The substrate or growth template is compatible with crystalline growth of a crystalline optical material. Patterned portions of the mask material are removed to expose one or more regions of the substrate or growth template. The one or more regions have target shapes of one or more optical components. The crystalline optical material is selectively grown in the one or more regions to form the one or more optical components.

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