Abstract:
A rotatable plug includes a plug body, a rotatable base and at least two conductive terminals. One end of the plug body has an accommodating space. The plug body is provided with a penetrating hole to make the plug body to form a hollow annular body. The rotatable base is rotatably provided in the accommodating space of the plug body. The two conductive terminals are provided on the rotatable base. The two conductive terminals rotate together with the rotatable base to the outside of the plug body or are accommodated in the plug body. Via this arrangement, the conductive terminals can be avoided from getting inclined or suffering damage by the impact or compression during transportation. Further, it is convenient for the user to put his/her finger in the hollow annular body to pull out the plug.
Abstract:
A memory device having improved sensing speed and reliability and a method of forming the same are provided. The memory device includes a first dielectric layer having a low k value over a semiconductor substrate, a second dielectric layer having a second k value over the first dielectric layer, and a capacitor formed in the second dielectric layer wherein the capacitor comprises a cup region at least partially filled by the third dielectric layer. The memory device further includes a third dielectric layer over the second dielectric layer and a bitline over the third dielectric layer. The bitline is electrically coupled to the capacitor. A void having great dimensions is preferably formed in the cup region of the capacitor.
Abstract:
A method for forming a strained channel in a semiconductor device is provided, comprises providing of a transistor comprising a gate stack exposed with a gate electrode on a semiconductor substrate, a pair of source/drain regions in the substrate on opposite sides of the gate stack and a pair of spacers on opposing sidewalls of the gate stack. A passivation layer is formed to cover the gate electrode and spacers of the transistor. A passivation layer is formed to cover the gate electrode and the spacers. A recess region is formed in each of the source/drain regions, wherein an edge of the recess region aligns to an outer edge of the spacers. The recess regions are filled with a strain-exerting material, thereby forming a strained channel region in the semiconductor substrate between the source/drain regions.
Abstract:
Embedded memories. The devices include a substrate, a first dielectric layer, a second dielectric layer, a third dielectric layer, and a plurality of capacitors. The substrate comprises transistors. The first dielectric layer, embedding first and second conductive plugs electrically connecting the transistors therein, overlies the substrate. The second dielectric layer, comprising a plurality of capacitor openings exposing the first conductive plugs, overlies the first dielectric layer. The capacitors comprise a plurality of bottom plates, respectively disposed in the capacitor openings, electrically connecting the first conductive plugs, a plurality of capacitor dielectric layers respectively overlying the bottom plates, and a top plate, comprising a top plate opening, overlying the capacitor dielectric layers. The top plate opening exposes the second dielectric layer, and the top plate is shared by the capacitors.
Abstract:
Two methods for substantially improving the integrity of a TiN barrier layer are disclosed. The first method allows an atmospheric anneal in a conventional semiconductor furnace. The atmospheric anneal substantially seals the exposed TiN surface preventing subsequent metal layers from migrating through the barrier layer. The second method involves a reaction within a plasma reactor using a plasma gas. The plasma gas reacts with titanium within the TiN film to form a desired titanium compound. The gas is adsorbed onto the TiN grains at the grain boundaries within the TiN film thus filling the grain boundaries and thus substantially preventing subsequent metal layers from migrating though the TiN barrier layer. The second method allows the deposition of TiN, the plasma reaction, and subsequent metal depositions to take place on the same equipment using the same evacuation cycle.
Abstract:
Embedded memories. The devices include a substrate, a first dielectric layer, a second dielectric layer, a third dielectric layer, and a plurality of capacitors. The substrate comprises transistors. The first dielectric layer, embedding first and second conductive plugs electrically connecting the transistors therein, overlies the substrate. The second dielectric layer, comprising a plurality of capacitor openings exposing the first conductive plugs, overlies the first dielectric layer. The capacitors comprise a plurality of bottom plates, respectively disposed in the capacitor openings, electrically connecting the first conductive plugs, a plurality of capacitor dielectric layers respectively overlying the bottom plates, and a top plate, comprising a top plate opening, overlying the capacitor dielectric layers. The top plate opening exposes the second dielectric layer, and the top plate is shared by the capacitors.
Abstract:
A method for forming a strained channel in a semiconductor device is provided, comprises providing of a transistor comprising a gate stack exposed with a gate electrode on a semiconductor substrate, a pair of source/drain regions in the substrate on opposite sides of the gate stack and a pair of spacers on opposing sidewalls of the gate stack. A passivation layer is formed to cover the gate electrode and spacers of the transistor. A passivation layer is formed to cover the gate electrode and the spacers. A recess region is formed in each of the source/drain regions, wherein an edge of the recess region aligns to an outer edge of the spacers. The recess regions are filled with a strain-exerting material, thereby forming a strained channel region in the semiconductor substrate between the source/drain regions.
Abstract:
A retractable extension socket includes an socket body, a fixing structure, a receiving structure, a conducting wire and a plug. The fixing structure and the receiving structure are disposed on the socket body. One end of the conducting wire is connected to the socket body. The plug is connected to the other end of the conducting wire. Thus, a retractable extension socket is formed. The retractable extension socket can be used as an extension socket. In addition, by winding the cable into the socket body and attaching the plug into the fixing structure, the retractable extension socket can be used as a single plug. Furthermore, the plug can be collected into the receiving structure in order that it can be carried around easily.
Abstract:
A portable adapter includes a first body; a second body; a pivoting unit, mounted between the first body and the second body; a power input, mounted on the first body; a power output, mounted on the first body near to the pivoting unit; and at least one connector, mounted on the second body. The pivoting unit unfolds the first body and the second body in a manner such that the power output is partially hidden between the first body and the second body. The foldable structure of the portable adapter has a reduced volume and the power output is partially hidden during travel. When in use with a laptop, the first body and the second body unfold to an angle of 90 degrees relative to each other by means of the pivoting unit, so that the connector can be plugged with an electronic device.
Abstract:
A foldable power supply device includes a first socket, a second socket, and a pivoting unit. The first socket has multiple sets of first plugging holes and first conductive plates. The second socket has multiple sets of second plugging holes and second conductive plates. The pivoting unit is located between the first socket and the second socket. The direction of the rotation shaft of the pivoting unit is not parallel to the plugging direction of the first plugging holes and the second plugging holes. Thereby, the foldable power supply device can be opened into a block type to lower its height and be used as a multi-hole type. Alternatively, the device can also be folded to become a vertical type so that one side of the device can align with the wall, and the plugs or the transformers can be plugged into the device in two face-to-face directions.