公开(公告)号：US20210223699A1

公开(公告)日：2021-07-22

申请号：US17141228

申请日：2021-01-05

Applicant: eChem Solutions Corp.

Inventor： Tz-Jin Yang ,  Yung-Yu Lin ,  Chi-Yu Lai ,  Ming-Che Chung ,  Che-Wei Chang

IPC: G03F7/34 ,  G03F7/037 ,  G03F7/038 ,  G03F7/00 ,  C08G73/10 ,  G03F7/42

Abstract: A method of removing a photoresist, a laminate, a method of forming a metallic pattern, a polyimide resin, and a stripper are provided. The method of removing the photoresist includes forming a release layer on a substrate, the release layer having a first surface and a second surface opposite to each other, wherein the first surface of the release layer is in contact with the substrate; forming a photoresist layer on the second surface of the release layer; and removing the release layer and the photoresist layer. The release layer is formed by a polyimide resin. The polyimide resin is obtained by performing a polymerization of tetracarboxylic dianhydrides, diamines, and phenolamines. The diamines include hydroxyfluorinated diamines, benzoic acid diamines, and aminotetramethyldisiloxanes.