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    METHODS AND SYSTEMS FOR MICRO BEARINGS
    2.
    发明申请
    METHODS AND SYSTEMS FOR MICRO BEARINGS 有权
    微型轴承的方法和系统

    公开(公告)号：US20080042520A1

    公开(公告)日：2008-02-21

    申请号：US11757344

    申请日：2007-06-01

    Applicant: Harold L. Stalford

    Inventor： Harold L. Stalford

    IPC: H01L41/00

    CPC classification number: B81B3/0059 ,  B81B2201/037 ,  B81B2203/06 ,  Y10T29/49647 ,  Y10T29/49696

    Abstract: A micro drive assembly may comprise a substrate, a micro shall oriented in-plane with the substrate and at least one micro bearing to support rotation of the micro shaft. The micro shaft and micro bearing may be in or less than the micrometer domain.

    Abstract translation: 微驱动组件可以包括基板，与基板成平面定向的微轴和至少一个微轴承以支撑微轴的旋转。 微轴和微型轴承可以在微米范围内或更小。

    System and method for post-fabrication reduction of minimum feature size spacing of microcomponents
    3.
    发明授权
    System and method for post-fabrication reduction of minimum feature size spacing of microcomponents 失效
    微元件最小特征尺寸间距后制造的系统和方法

    公开(公告)号：US07240420B1

    公开(公告)日：2007-07-10

    申请号：US09884205

    申请日：2001-06-19

    Applicant: Matthew D. Ellis ,  Eric G. Parker ,  George D. Skidmore

    Inventor： Matthew D. Ellis ,  Eric G. Parker ,  George D. Skidmore

    IPC: B81B5/00

    CPC classification number: B81B3/0054 ,  B81B2201/037 ,  Y10T29/5313

    Abstract: A system and method are disclosed which enable post-fabrication reduction of minimum feature size spacing of microcomponents. A method for producing an assembly of microcomponents is provided, in which at least two microcomponents are fabricated having a separation space therebetween. At least one of the microcomponents includes an extension part that is operable to reduce the separation space. Such an extension part may include an extension member that is movably extendable away from its associated microcomponent to reduce the separation space between its associated microcomponent and another microcomponent. The extension part may be latched at a desired position by a latching mechanism. The extension part may be implemented such that the extension member eliminates the separation space, thereby resulting in such extension member engaging another microcomponent. Such engagement may be achieved without requiring power to be applied to the microcomponents. Certain embodiments are insensitive to etching inaccuracy encountered during fabrication.

    Abstract translation: 公开了一种系统和方法，其使后期制造减少了微型部件的最小特征尺寸间距。 提供了一种用于制造微组件组件的方法，其中制造了至少两个在其间具有分隔空间的微组件。 微组件中的至少一个包括可操作以减小分离空间的延伸部分。 这种延伸部分可以包括可移动地延伸远离其相关联的微型部件的延伸部件，以减小其相关的微型部件和另一微型部件之间的分离空间。 延伸部分可以通过闭锁机构锁定在期望的位置。 延伸部件可以被实现为使得延伸部件消除分离空间，从而导致这种延伸部件与另一个微型部件接合。 可以在不需要将功率施加到微型部件的情况下实现这种接合。 某些实施例对制造期间遇到的蚀刻不精确性不敏感。

    Dual position linear displacement micromechanism
    4.
    发明申请
    Dual position linear displacement micromechanism 有权
    双位置线性位移微机构

    公开(公告)号：US20050073380A1

    公开(公告)日：2005-04-07

    申请号：US10363243

    申请日：2001-09-12

    Applicant: Larry Howell ,  Scott Lyon ,  Brent Weight ,  Deanne Clements

    Inventor： Larry Howell ,  Scott Lyon ,  Brent Weight ,  Deanne Clements

    IPC: B81B3/00 ,  H01F1/00 ,  H01F7/00

    CPC classification number: B81B3/0062 ,  B81B3/0054 ,  B81B2201/037 ,  B81B2203/051 ,  B81B2203/053 ,  H01F2007/068 ,  H01H1/0036 ,  H01H61/04 ,  H01H2001/0042 ,  H01H2001/0047 ,  H01H2001/0078 ,  H01H2061/006

    Abstract: An apparatus (1) that is capable of a first stable configuration and a second stable configuration is disclosed. The bistable mechanism (10) has a leg (30, 32) that is coupled on one end by a base member (22, 24) and on the other end by a shuttle (20). The leg (30, 32) stores potential energy as it is deflected. The potential energy stored in the leg (30, 32) has a maximum potential energy position with a low potential energy position on either side of the maximum. An apparatus and method are also disclosed for a latching mechanism (910) and the associated method. The latching mechanism (910) is comprised of a grasping member (932), a lock slider (928), and a detent slider (916). These three members (916, 928, 932) operate together to induce a locked configuration and an unlocked configuration by actuating the lock slider (928) in a single direction.

    Abstract translation: 公开了能够实现第一稳定配置和第二稳定配置的设备（1）。 双稳态机构（10）具有腿部（30,32），其一端由基部构件（22,24）联接，另一端由梭子（20）联接。 腿部（30,32）在其偏转时存储势能。 存储在腿部（30,32）中的势能具有在最大值两侧具有低势能位置的最大势能位置。 还公开了一种用于锁定机构（910）和相关方法的装置和方法。 锁定机构（910）包括把持件（932），锁定滑块（928）和制动滑块（916）。 这三个构件（916,928,932）通过一致地驱动锁定滑块（928）而一起操作以引起锁定构型和解锁构造。

    MICRO TRANSPORT MACHINE AND METHODS FOR USING SAME
    8.
    发明申请
    MICRO TRANSPORT MACHINE AND METHODS FOR USING SAME 有权
    微型运输机及其使用方法

    公开(公告)号：US20080087478A1

    公开(公告)日：2008-04-17

    申请号：US11757341

    申请日：2007-06-01

    Applicant: Harold Stalford

    Inventor： Harold Stalford

    IPC: B60K1/00

    CPC classification number: B81B3/0024 ,  B81B2201/032 ,  B81B2201/034 ,  B81B2201/037 ,  B81B2201/051 ,  H02N1/008

    Abstract: A micro transport machine may include a substrate and a movable device comprising a drive component responsive to a wireless power source. The movable device is operable to move between a plurality of disparate areas on the substrate.

    Abstract translation: 微型运输机器可以包括基板和可移动装置，其包括响应于无线电源的驱动部件。 可移动装置可操作以在基板上的多个不同区域之间移动。

    Micro-miniature structures and method of fabrication thereof
    9.
    发明授权
    Micro-miniature structures and method of fabrication thereof 失效
    微型微型结构及其制造方法

    公开(公告)号：US5364742A

    公开(公告)日：1994-11-15

    申请号：US948189

    申请日：1992-09-21

    Applicant: Long-Shen Fan ,  Hans H. Zappe

    Inventor： Long-Shen Fan ,  Hans H. Zappe

    IPC: C23C28/00 ,  B81B5/00 ,  B81C99/00 ,  G03F7/00 ,  G03F7/11 ,  G03F7/26 ,  H01L21/306 ,  H02N1/00 ,  G03C5/00 ,  B44C1/22

    CPC classification number: G03F7/11 ,  B81C99/0085 ,  G03F7/00 ,  H02N1/008 ,  B81B2201/035 ,  B81B2201/037

    Abstract: In the fabrication of a free-standing miniaturized structure in a range of about 10 to 20 .mu.m thick, a method based on a sacrificial system includes the steps of selecting a substrate material, depositing on the substrate material a sacrificial layer of material and patterning the sacrificial layer to define a shape. A photoresist layer of material is deposited on the sacrificial layer and patterned by contrast-enhanced photolithography to form a photoresist mold. Upon the mold there is plated a metallic layer of material. The electroplated structure conforms to the resist profile and can have a thickness many times that of conventional polysilicon microstructures. The photoresist mold and the sacrificial layer are thereafter dissolved using etchants to form a free standing metallic structure in a range of about 10 to 20 .mu.m thick, with vertical to lateral aspect ratios of 9:1 to 10:1 or more.

    Abstract translation: 在制造大约10至20μm厚的独立小型化结构的过程中，基于牺牲系统的方法包括以下步骤：选择衬底材料，在衬底材料上沉积材料的牺牲层和图案化 牺牲层来定义一个形状。 材料的光致抗蚀剂层沉积在牺牲层上并通过对比度增强的光刻法形成光致抗蚀剂模具。 在模具上镀有金属层材料。 电镀结构符合抗蚀剂轮廓，并且其厚度可以是常规多晶硅微结构的厚度。 然后，使用蚀刻剂溶解光致抗蚀剂模具和牺牲层，以形成约10至20μm厚的独立金属结构，垂直与横向纵横比为9:1至10:1或更高。

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