公开(公告)号：US20040033318A1

公开(公告)日：2004-02-19

申请号：US10376253

申请日：2003-03-03

Applicant: SEIKO EPSON CORPORATION ,  YOUTEC CO., LTD.

Inventor： Takeshi Kijima ,  Eiji Natori ,  Mitsuhiro Suzuki

IPC: C08F002/46 ,  C08J007/00 ,  C08F002/48 ,  G21H001/00 ,  B05D003/00 ,  C08J007/18 ,  G21H005/00 ,  B06B001/00 ,  B01J019/08 ,  B01J019/10 ,  B05C005/00 ,  B05B007/00 ,  B05C015/00 ,  B05B005/025 ,  B05C009/08

CPC classification number: C23C18/1216 ,  B01J3/008 ,  B01J19/0013 ,  B01J19/123 ,  B01J19/125 ,  B01J19/1887 ,  B01J2219/00058 ,  B05D1/025 ,  B05D2401/90 ,  C23C18/12 ,  C23C18/1283 ,  C23C18/1287 ,  C23C18/14 ,  Y02P20/544

Abstract: To provide an apparatus and method for forming a thin-film using raw material fluid containing a film ingredient and supercritical fluid or liquid. An apparatus according to the present invention is used for forming a thin-film using raw material fluid containing alcohol, supercritical fluid or liquid carbon dioxide, and a condensation polymer containing an element of a target metal oxide compound. This apparatus includes a substrate holder 2 for retaining a substrate 3, a film-forming chamber 1 for housing the substrate holder, a feeding means for feeding the raw material fluid to the substrate surface, and a lamp heater 4 for heating the substrate 3 retained to the substrate holder 2. Thereby, the thin-film can be formed using the raw material fluid containing a film ingredient and the supercritical fluid or liquid.

Abstract translation: 提供使用含有膜成分和超临界流体或液体的原料流体形成薄膜的装置和方法。 根据本发明的装置用于使用含有醇，超临界流体或液体二氧化碳的原料流体和含有目标金属氧化物化合物元素的缩聚物形成薄膜。 该装置包括用于保持基板3的基板保持件2，用于容纳基板保持件的成膜室1，用于将原料流体供给到基板表面的进给装置和用于加热保持的基板3的灯加热器4 由此，可以使用含有膜成分和超临界流体或液体的原料液形成薄膜。

公开(公告)号：US20040170538A1

公开(公告)日：2004-09-02

申请号：US10473644

申请日：2004-04-15

Inventor： Kouji Kawakami ,  Yujiro Kitaide ,  Nobuhisa Kato

IPC: B06B001/00 ,  B01J019/12 ,  B01J019/10

CPC classification number: B01J19/123 ,  A62D2203/10 ,  B01J19/10 ,  B01J2219/00015 ,  B01J2219/00038 ,  B01J2219/0004 ,  B01J2219/00137 ,  B01J2219/0877 ,  C02F1/325 ,  C02F1/36 ,  C02F1/66 ,  C02F1/722 ,  C02F2101/322 ,  C02F2101/36 ,  C02F2101/363 ,  C02F2101/366 ,  C02F2103/06 ,  C02F2201/3227 ,  C02F2201/3228 ,  C02F2209/02 ,  C02F2209/06

Abstract: The present invention provides a method and a device, by which it is possible to decompose and treat a large amount of organic halogen compounds, etc. which are environmental pollutants, to a low concentration range at which it is dischargeable as waste liquor to sewage in a short time, and it is also possible to decompose organic substances and nitrogen or phosphorus compounds which are hardly decomposable by oxidation. To a sample solution 20 contained in a reaction vessel 10a in which an aqueous solution containing environmental pollutants is stored, for example, ultrasonic waves 50 are irradiated from a transducer 30a disposed at the central bottom portion of the reaction vessel 10a, and at the same time, ultraviolet rays are irradiated from an ultraviolet lamp 40a disposed at the peripheral edge of the reaction vessel 10a. In this instance, the ultraviolet lamp 40a is disposed at a position such that it does not interfere with the path of travel of ultrasonic waves 50.

Abstract translation: 本发明提供一种方法和装置，通过该方法和装置，可以将大量作为环境污染物的有机卤素化合物等分解和处理至低浓度范围，作为废液排放到污水中 短时间，也可以分解通过氧化难以分解的有机物质和氮或磷化合物。 存储在其中储存有环境污染物的水溶液的反应容器10a中的样品溶液20例如从设置在反应容器10a的中央底部的换能器30a照射超声波50， 时间，从设置在反应容器10a的周缘的紫外灯40a照射紫外线。 在这种情况下，紫外线灯40a设置在不干扰超声波50的行进路径的位置。

公开(公告)号：US20040062874A1

公开(公告)日：2004-04-01

申请号：US10219967

申请日：2002-08-14

Inventor： Yong Bae Kim ,  Kent Child ,  Yong Ho Lee ,  In Kwon Jeong ,  Jungyup Kim

IPC: B05B001/08 ,  B01J019/10 ,  B05B003/00 ,  B05D001/02

CPC classification number: H01L21/67051

Abstract: A system and method for wet cleaning a semiconductor wafer utilizes a nozzle assembly to combine two or more input fluids to form a cleaning fluid at the point-of-use. The input fluids are received at the nozzle assembly and combined in a chamber of the nozzle assembly to form the cleaning fluid. The nozzle assembly may include an acoustic transducer to generate an acoustic energy, one or more valves, e.g., three-way valves, to control the receipt of input fluids and/or a flow control mechanism, e.g., a pressure spring valve, to control dispensing of the cleaning fluid onto a surface of the semiconductor wafer.

Abstract translation: 用于湿式清洁半导体晶片的系统和方法利用喷嘴组件来组合两个或更多个输入流体以在使用点形成清洁流体。 输入流体在喷嘴组件处被接收并且组合在喷嘴组件的腔室中以形成清洁流体。 喷嘴组件可以包括用于产生声能的声换能器，一个或多个阀，例如三通阀，以控制输入流体的接收和/或流量控制机构，例如压力弹簧阀，以控制 将清洁流体分配到半导体晶片的表面上。